Designing bioelectronic devices that seamlessly integrate with the human body is a
technological pursuit of great importance. Bioelectronic medical devices that reliably and …

Nanocrystalline 3 µm thick Cu1–xNix (0.45≤ x≤ 0.87) films are electrodeposited
galvanostatically onto Cu/Ti/Si (100) substrates, from a citrate‐and sulphate‐based bath …

Silicon nitride and silicon oxynitride thin films are widely used in microelectronic fabrication
and microelectromechanical systems (MEMS). Their mechanical properties are important for …

We report the successful fabrication of high-quality a-Si: H thin-film transistors (TFTs) on
stainless steel foil substrates. TFTs with an inverted-staggered structure were grown on 200 …

The ability to selectively chemically functionalize silicon nitride (Si 3 N 4) or silicon dioxide
(SiO 2) surfaces after cleaning would open interesting technological applications. In order to …

In this paper we describe the growth of silicon nitride from nitrogen and silane for the first
time by capacitively coupled remote PECVD. We report on the effect of process parameters …

Silicon carbonitride thin films have been deposited by plasma enhanced chemical vapor
deposition (PECVD) from bis (dimethylamino) dimethylsilane (BDMADMS) as a function of …

The residual coating stress and its control is of key importance for the performance and
reliability of silicon nitride (SiN x) coatings for biomedical applications. This study explores …

The dynamic roughening of amorphous silicon nitride growth front prepared by a plasma-
enhanced chemical vapor deposition is presented. Morphology of the films grown at different …

A record in laser doped selective emitter (LDSE) solar cells with an efficiency η= 19.2% is
reported. In this study, we investigate the effect of SiNx films for laser doped selective emitter …