The primary requirement for the development of tools for extreme ultraviolet lithography
(EUVL) has been the identification and optimization of suitable sources. These sources must …

One of fundamental aims of extreme ultraviolet (EUV) lithography is to maximize brightness
or conversion efficiency of laser energy to radiation at specific wavelengths from laser …

We publish three Roadmaps on photonic, electronic and atomic collision physics in order to
celebrate the 60th anniversary of the ICPEAC conference. In Roadmap II we focus on …

We have prepared various low-density Gd targets to investigate the effect of concentration
on the extreme ultraviolet (EUV) radiation near 6.7 ánm and out-of-band emission from laser …

Lithography tools are being built and shipped to semiconductor manufacturers for high
volume manufacturing using extreme ultraviolet lithography (EUVL) at a wavelength of 13.5 …

We present the experimental investigations of extreme ultraviolet (EUV) radiation of laser-
produced plasma based on the micro-structured Gd target and obtain a strong EUV radiation …

We report a comprehensive study of the emission from Gd and Tb laser-produced plasmas
in the 6.5–6.7-nm wavelength region for a broad range of laser-irradiation parameters using …

The gadolinium (Gd) plasma is a potential beyond-EUV (BEUV) source for the extension of
extreme ultraviolet lithography at 13.5 nm. A laser induced discharge plasma (LDP) is an …

This paper presents comprehensive spectral measurements and a theoretical analysis of
laser-produced germanium (Ge) plasma within the 7.5–17 nm wavelength range, with the …

Experimental and theoretical analyses are reported for the spatiotemporal evolution of
extreme ultraviolet spectra in laser-produced silver (Ag) plasmas. The time-resolved spectra …