This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the
authoritative reference book on EUV source technology. The volume contains 38 chapters …

The primary requirement for the development of tools for extreme ultraviolet lithography
(EUVL) has been the identification and optimization of suitable sources. These sources must …

Extreme ultraviolet (EUV) radiation from laser-produced plasma (LPP) has been thoroughly
studied for application in mass production of next-generation semiconductor devices. One …

Abstract Dual-pulse (DP) laser-induced breakdown spectroscopy (LIBS) provides significant
improvement in signal intensity as compared to conventional single-pulse LIBS. We …

An examination of the influence of target composition and viewing angle on the extreme
ultraviolet spectra of laser produced plasmas formed from tin and tin doped planar targets is …

We optimize the conversion of laser energy into extreme ultraviolet (EUV) radiation by
tailoring the laser parameters for a laser-produced plasma generated from 20 μm diameter …

We report results from a combined optical interferometric and spectrally resolved imaging
study on colliding laser produced aluminium plasmas. A Nomarski interferometer was used …

The expansion dynamics of ion and neutral species in laterally colliding laser produced
aluminum plasmas have been investigated using time and space resolved optical emission …

In this report, two collinear laser pulses were used to investigate the laser-induced
breakdown spectroscopy (LIBS) emission from aluminum (Al) plasma, for the two cases with …

We demonstrate efficient enhancement of soft X-ray (SXR) emission from molybdenum
plasmas produced using dual pulse irradiation, in which 10-ns and 150-ps pre-pulses were …