Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy

SA Bogachev, NI Chkhalo, SV Kuzin, DE Pariev… - Applied Optics, 2016 - opg.optica.org
We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar
astronomy in the wavelength ranges: λ= 12.9–13.3 nm, λ= 17–21 nm, λ= 28–33 nm, and λ …

Current Sources of Vacuum Ultraviolet Radiation: State and Prospects (A Review)

EA Sosnin, DA Sorokin - Plasma Physics Reports, 2024 - Springer
Physical principles and modern techniques for the formation of spontaneous vacuum
ultraviolet radiation are described for three cases: the formation of line spectra of atoms, line …

Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures, Russian Academy of Sciences

AD Akhsakhalyan, EB Kluenkov, AY Lopatin… - Journal of Surface …, 2017 - Springer
A real opportunity for applying traditional optical methods to soft X-ray and extreme UV
(ultraviolet) radiation bands has appeared thanks to recent successes in the area of …

Reactive diffusion in multilayer metal/silicon nanostructures

EN Zubarev - Physics-Uspekhi, 2011 - iopscience.iop.org
Reactive diffusion in nanomaterials differs widely from that in bulk materials. Reviewed in
this paper are the basic models and experimental data on how diffusion and phase …

Quantum Confinement Effect in a Nanoscale Mo/Si Multilayer Structure

N Kumar, AT Kozakov, AV Nezhdanov… - The Journal of …, 2020 - ACS Publications
In a condensed matter system, phonons and plasmons are well-known quasiparticles that
represent unusual dispersion behavior of energy and momentum at nanoscales. In a …

Phase-microstructure of Mo/Si nanoscale multilayer and intermetallic compound formation in interfaces

N Kumar, AV Nezhdanov, RM Smertin, VN Polkovnikov… - Intermetallics, 2020 - Elsevier
Microstructural investigation of the Mo/Si nanoscale multilayers (MLs) is essential to design
high-reflective nanomirrors. Raman spectroscopy showed existence of silicon layer in the …

Sputter depth profiling of Mo/B4C/Si and Mo/Si multilayer nanostructures: A round-robin characterization by different techniques

B Ber, P Bábor, PN Brunkov, P Chapon, MN Drozdov… - Thin Solid Films, 2013 - Elsevier
A round-robin characterization is reported on the sputter depth profiling of [60×(3.0 nm
Mo/0.3 nm B 4 C/3.7 nm Si)] and [60×(3.5 nm Mo/3.5 nm Si)] stacks deposited on Si (111) …

Состояние дел и перспективы развития многослойной рентгеновской оптики в ИФМ РАН

АД Ахсахалян, ЕБ Клюенков, АЯ Лопатин… - Поверхность …, 2017 - elibrary.ru
Благодаря современным успехам в области напыления многослойных зеркал и
технологии изготовления сверхгладких и сверхточных подложек для зеркал появилась …

Raman scattering study of nanoscale Mo/Si and Mo/Be periodic multilayer structures

N Kumar, VA Volodin, RM Smertin, PA Yunin… - Journal of Vacuum …, 2020 - pubs.aip.org
Investigation of the microstructure and phase analysis of the periodic Mo/Si and Mo/Be
multilayers are essential for depositing high reflective multilayers that operate at soft x-ray to …

The role of ultra-thin carbon barrier layers for fabrication of La/B4C interferential mirrors: Study by time-of-flight secondary ion mass spectrometry and high-resolution …

MN Drozdov, YN Drozdov, NI Chkhalo, VN Polkovnikov… - Thin Solid Films, 2015 - Elsevier
Time-of-flight secondary ion mass spectrometry and high-resolution transmission electron
microscopy study is reported on depth profiling of 375 nm-thick multilayer La/B 4 C …