Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the continued miniaturization of semiconductor devices. The required EUV light, at …
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
We studied Extreme Ultra-Violet (EUV) emission characteristics of the 13.5 nm wavelength from CO_2 laser-irradiated pre-formed tin plasmas using 2D radiation hydrodynamic …
DJ Hemminga, L Poirier, MM Basko… - Plasma Sources …, 2021 - iopscience.iop.org
We present the results of a joint experimental and theoretical study of plasma expansion arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
DJ Hemminga, OO Versolato, J Sheil - Physics of Plasmas, 2023 - pubs.aip.org
We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the λ laser= 1.064− 10.6 μ m range and laser intensities of I laser= 0.5 …
Experimental spectroscopic studies are presented, in a 5.5–25.5 nm extreme-ultraviolet (EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin …
Y Pan, K Tomita, A Sunahara, A Sasaki… - Applied Physics …, 2023 - pubs.aip.org
We present the results of joint measurements of electron density ( ne), temperature ( T e), and emission spectra of an Nd: YAG-driven tin plasma. Collective Thomson scattering …
We demonstrate the efficient generation of extreme ultraviolet (EUV) light from laser- produced plasma (LPP) driven by 2 μm wavelength laser light as an alternative for 10 μm …