Characterization and modelling of Si-substrate noise induced by RF signal propagating in TSV of 3D-IC stack

M Brocard, P Le Maître, C Bermond… - 2012 IEEE 62nd …, 2012 - ieeexplore.ieee.org
TSVs in 3D integrated circuits are a source of noise that can affect nearby transistor
performance. So an analytical physics-based model of the TSV-to-substrate coupling is …

Characterization of signal transfer performance of a through glass via (TGV) substrate with silicon vertical feedthroughs

L Wenyin, W Xuezhong, X Dingbang… - Microelectronic …, 2016 - Elsevier
In this paper, we present an analysis of signal transfer performance of the through glass via
(TGV) deposited with metal electrodes. Because of the parasitical effects, signal will be …

Overview and study of the 3D-TSV interconnects induced coupling in CMOS circuits

MEA Benkechkache, S Latreche… - arXiv preprint arXiv …, 2022 - arxiv.org
The semiconductor industry's rapid advancement pushes conventional two-dimensional
technology to its utmost limitations in terms of scaling, performance, and cost factors. These …

[HTML][HTML] Transceiver with inductive coupling for wireless chip-to-chip communication using a 50-nm digital CMOS process

C Lee, J Park, J Yoo, H Cho, J Choi, J Cho… - Microelectronics Journal, 2013 - Elsevier
A wireless type of chip-to-chip communication (WCC) technology is proposed as the next
generation of 3D semiconductor technology. To demonstrate the feasibility of this …

[HTML][HTML] Analytical and numerical model confrontation for transfer impedance extraction in three-dimensional radio frequency circuits

O Valorge, F Sun, JE Lorival, M Abouelatta-Ebrahim… - 2012 - scirp.org
3D chip stacking is considered known to overcome conventional 2D-IC issues, using
through silicon vias to ensure vertical signal transmission. From any point source …

Modelling and analysis of the effect of stacking chips with TSVs in 3D IC package encapsulation process

CY Khor, MZ Abdullah - Maejo International Journal of Science …, 2012 - search.proquest.com
This paper presents the modelling and analysis of the encapsulation process for three-
dimensional (3D) stacking-chip package with through-silicon via (TSV) integration. The fluid …

Architectural exploration methods and tools for heterogeneous 3d-ic

FF Ferreira - 2012 - theses.fr
L'intégration tridimensionnelle (3D), où plusieurs puces sont empilées et interconnectées,
est en train de révolutionner l'industrie des semi-conducteurs. Cette technologie permet …

Device and electromagnetic co-simulation of TSV: Substrate noise study and compact modeling of a TSV in a matrix

P Le Maitre, M Brocard, A Farcy… - … Symposium on Quality …, 2012 - ieeexplore.ieee.org
This paper presents the results obtained from the simulation of TSV structures in face-to-
back stacked dice. A novel simulation tool enabling device and electromagnetic (EM) co …

Caractérisation et analyse du couplage substrat entre le TSV et les transistors MOS dans les circuits intégrés 3D.

M Brocard - 2013 - theses.hal.science
Ces dernières années ont vu l'émergence d'un nouveaux concept dans le domaine de la
microélectronique pour répondre aux besoins grandissant en termes de performances et …

Analysis of Through Silicon Vias and substrate coupling in 3D CMOS circuits by Spice simulations

M el Amine Benkechkache, S Latreche… - … on Engineering and …, 2021 - ieeexplore.ieee.org
The rapid pace of improvement of semiconductor industry drives the traditional 2D
technology to reach its limits in regard of performance, scaling and cost criteria. These …