Si–Ge–Sn alloys: From growth to applications

S Wirths, D Buca, S Mantl - Progress in crystal growth and characterization …, 2016 - Elsevier
In this review article, we address key material parameters as well as the fabrication and
application of crystalline GeSn binary and SiGeSn ternary alloys. Here, the transition from an …

Semiconductor nanowires: to grow or not to grow?

PC McIntyre, AF i Morral - Materials Today Nano, 2020 - Elsevier
Semiconductor nanowires have demonstrated exciting properties for nanophotonics,
sensors, energy technologies, and end-of-roadmap and beyond-roadmap electronic …

On-chip light sources for silicon photonics

Z Zhou, B Yin, J Michel - Light: Science & Applications, 2015 - nature.com
Serving as the electrical to optical converter, the on-chip silicon light source is an
indispensable component of silicon photonic technologies and has long been pursued …

Growth and applications of GeSn-related group-IV semiconductor materials

S Zaima, O Nakatsuka, N Taoka… - … and technology of …, 2015 - iopscience.iop.org
We review the technology of Ge 1− x Sn x-related group-IV semiconductor materials for
developing Si-based nanoelectronics. Ge 1− x Sn x-related materials provide novel …

Direct-bandgap GeSn grown on silicon with 2230 nm photoluminescence

SA Ghetmiri, W Du, J Margetis, A Mosleh… - Applied Physics …, 2014 - pubs.aip.org
Material and optical characterizations have been conducted for epitaxially grown Ge 1− x Sn
x thin films on Si with Sn composition up to 10%. A direct bandgap Ge 0.9 Sn 0.1 alloy has …

[HTML][HTML] Diffusion of n-type dopants in germanium

A Chroneos, H Bracht - Applied Physics Reviews, 2014 - pubs.aip.org
Germanium is being actively considered by the semiconductor community as a mainstream
material for nanoelectronic applications. Germanium has advantageous materials …

Undoped and in-situ B doped GeSn epitaxial growth on Ge by atmospheric pressure-chemical vapor deposition

B Vincent, F Gencarelli, H Bender, C Merckling… - Applied Physics …, 2011 - pubs.aip.org
In this letter, we propose an atmospheric pressure-chemical vapor deposition technique to
grow metastable GeSn epitaxial layers on Ge. We report the growth of defect free fully …

Band structure calculations of Si–Ge–Sn alloys: achieving direct band gap materials

P Moontragoon, Z Ikonić… - … science and technology, 2007 - iopscience.iop.org
Alloys of silicon (Si), germanium (Ge) and tin (Sn) are continuously attracting research
attention as possible direct band gap semiconductors with prospective applications in …

GeSn pin photodetector for all telecommunication bands detection

S Su, B Cheng, C Xue, W Wang, Q Cao, H Xue… - Optics express, 2011 - opg.optica.org
Using a 820 nm-thick high-quality Ge_0. 97Sn_0. 03 alloy film grown on Si (001) by
molecular beam epitaxy, GeSn pin photodectectors have been fabricated. The detectors …

[HTML][HTML] Systematic study of Ge1− xSnx absorption coefficient and refractive index for the device applications of Si-based optoelectronics

H Tran, W Du, SA Ghetmiri, A Mosleh, G Sun… - Journal of Applied …, 2016 - pubs.aip.org
The absorption coefficient and refractive index of Ge 1− x Sn x alloys (x from 0% to 10%)
were characterized for the wavelength range from 1500 to 2500 nm via spectroscopic …