High-density integration of uniform sub-22 nm silicon nanowires for transparent thin film transistors on glass

W Liao, Y Zhang, D Li, J Wang, L Yu - Applied Surface Science, 2025 - Elsevier
Ultrathin catalytical silicon nanowires (SiNWs), grown as orderly arrays upon glass
substrates, are ideal 1D channels for the construction of high-performance field effect …

Understanding electromigration failure behaviors of narrow cobalt lines and the mechanism of reliability enhancement for extremely dilute alloying of manganese …

JS Fang, GS Chen, CC Chang, CN Hsiao… - Journal of Alloys and …, 2024 - Elsevier
Self-forming barriers for copper (Cu) interconnect metallization are well developed.
However, the self-forming-barrier process and associated electromigration behaviors of …

Impact of UV annealing on the hole effective mobility in SnO pFET

SH Zeng, P Pooja, J Wu, A Chin - Scientific Reports, 2024 - nature.com
Using ultraviolet (UV) annealing through wide energy bandgap HfO2/SiO2 gate dielectric,
nanosheet SnO pFET achieved hole effective mobility (µeff) from 55 cm2/Vs at low hole …

Advancements in single-crystal silicon with elevated-laser-liquid-phase-epitaxy (ELLPE) for monolithic 3D ICs

BJ Shih, YM Pan, HT Chung, NC Lin… - Japanese Journal of …, 2024 - iopscience.iop.org
In this study, we present a low thermal budget elevated-laser-liquid-phase-epitaxy technique
designed for the precise fabrication of single-crystal islands (SCIs) intended for use in …