Lubricants have played important roles in friction and wear reduction and increasing
efficiency of mechanical systems. To optimize tribological performance, chemical reactions …

Surficial water adsorption and interfacial water condensation as natural phenomena that can
alter the contact status of the solid interface and tribological performances are crucial in all …

Interfacial shear-driven or shear-assisted chemical reactions play an important role in many
engineering processes, including reactions between lubricant additives and the surfaces of …

The friction of hydrogenated diamond-like carbon (H-DLC) films was evaluated under the
controlled environments of humid air and vacuum by varying the applied load. In humid air …

Reactive molecular dynamics (ReaxFF) simulations are performed to explore the atomistic
mechanism of chemical mechanical polishing (CMP) processes on a Si (110) surface …

Ultra-precision grinding is a fundamental machining method as for silicon. In grinding,
abrasive particles repetitively scratch on the workpiece surface, and the subsurface damage …

Using atomic force microscopy and scanning electron microscopy, the mechanical removal
mechanism of silicon with different exposure surfaces of cerium oxide (CeO 2) is studied. It is …

Nanoparticle jet polishing (NJP) is an ultra-smooth surface polishing technology based on
elastic material removal, which can obtain atomic-scale smooth surface. It is helpful for the …

Surface moisture or humidity impacting the lubrication property is a ubiquitous phenomenon
in tribological systems, which is demonstrated by a combination of molecular dynamics (MD) …

Colloidal silica occupies the field of polishing solution application of chemical mechanical
polishing (CMP). Si-OH groups dominate the surface of colloidal silica nanoparticles, and …