Si–Ge–Sn alloys: From growth to applications

S Wirths, D Buca, S Mantl - Progress in crystal growth and characterization …, 2016 - Elsevier
In this review article, we address key material parameters as well as the fabrication and
application of crystalline GeSn binary and SiGeSn ternary alloys. Here, the transition from an …

Review of Si-based GeSn CVD growth and optoelectronic applications

Y Miao, G Wang, Z Kong, B Xu, X Zhao, X Luo, H Lin… - Nanomaterials, 2021 - mdpi.com
GeSn alloys have already attracted extensive attention due to their excellent properties and
wide-ranging electronic and optoelectronic applications. Both theoretical and experimental …

[HTML][HTML] Systematic study of Ge1− xSnx absorption coefficient and refractive index for the device applications of Si-based optoelectronics

H Tran, W Du, SA Ghetmiri, A Mosleh, G Sun… - Journal of Applied …, 2016 - pubs.aip.org
The absorption coefficient and refractive index of Ge 1− x Sn x alloys (x from 0% to 10%)
were characterized for the wavelength range from 1500 to 2500 nm via spectroscopic …

Improving carrier mobility of polycrystalline Ge by Sn doping

K Moto, R Yoshimine, T Suemasu, K Toko - Scientific reports, 2018 - nature.com
To improve the performance of electronic devices, extensive research efforts have recently
focused on the effect of incorporating Sn into Ge. In the present work, we investigate how Sn …

Highly Selective Dry Etching of Germanium over Germanium–Tin (Ge1–xSnx): A Novel Route for Ge1–xSnx Nanostructure Fabrication

S Gupta, R Chen, YC Huang, Y Kim, E Sanchez… - Nano …, 2013 - ACS Publications
We present a new etch chemistry that enables highly selective dry etching of germanium
over its alloy with tin (Ge1–x Sn x). We address the challenges in synthesis of high-quality …

7-nm FinFET CMOS design enabled by stress engineering using Si, Ge, and Sn

S Gupta, V Moroz, L Smith, Q Lu… - IEEE transactions on …, 2014 - ieeexplore.ieee.org
Bandgap and stress engineering using group IV materials-Si, Ge, and Sn, and their alloys
are employed to design a FinFET-based CMOS solution for the 7-nm technology node and …

Growth of high-Sn content (28%) GeSn alloy films by sputtering epitaxy

J Zheng, Z Liu, Y Zhang, Y Zuo, C Li, C Xue… - Journal of Crystal …, 2018 - Elsevier
Crystalline GeSn thin films with Sn content up to 0.28 were deposited on Sn graded GeSn
buffer on a Ge substrate at low temperatures by sputtering epitaxy. The structural properties …

70° C synthesis of high-Sn content (25%) GeSn on insulator by Sn-induced crystallization of amorphous Ge

K Toko, N Oya, N Saitoh, N Yoshizawa… - Applied Physics …, 2015 - pubs.aip.org
70 C synthesis of high-Sn content (25%) GeSn on insulator by Sn-induced crystallization of
amorphous Ge | Applied Physics Letters | AIP Publishing Skip to Main Content Umbrella Alt …

[HTML][HTML] Local ordering in Ge/Ge–Sn semiconductor alloy core/shell nanowires revealed by extended x-ray absorption fine structure (EXAFS)

JZ Lentz, JC Woicik, M Bergschneider, R Davis… - Applied Physics …, 2023 - pubs.aip.org
Short-range atomic order in semiconductor alloys is a relatively unexplored topic that may
promote design of new materials with unexpected properties. Here, local atomic ordering is …

Scalable fabrication of self-assembled GeSn vertical nanowires for nanophotonic applications

G Lin, Y An, H Ding, H Zhao, J Wang, S Chen, C Li… - …, 2023 - degruyter.com
In this work, scalable fabrication of self-assembled GeSn vertical nanowires (NWs) based on
rapid thermal annealing (RTA) and inductively coupled-plasma (ICP) dry etching was …