Dye sensitized solar cells: a review

A Jena, SP Mohanty, P Kumar, J Naduvath… - Transactions of the …, 2012 - Taylor & Francis
The development of dye sensitized solar cells (DSSCs), which have derived inspiration from
photosynthesis, has opened up exciting new possibilities and paradigms for producing solar …

Novel magnetic nanomaterials inspired by magnetotactic bacteria: Topical review

T Prozorov, DA Bazylinski, SK Mallapragada… - Materials Science and …, 2013 - Elsevier
Magnetotactic bacteria, known to produce magnetic nanocrystals with uniform shapes and
sizes at physiological conditions, serve as an inspiration and source of a number of …

Magnetoelectric effects in local light-matter interactions

KY Bliokh, YS Kivshar, F Nori - Physical review letters, 2014 - APS
We study the generic dipole interaction of a monochromatic free-space electromagnetic field
with a bi-isotropic nanoparticle or a molecule. Contributions associated with the breaking of …

Interfacial chemistry of oxides on InxGa (1− x) As and implications for MOSFET applications

CL Hinkle, EM Vogel, PD Ye, RM Wallace - Current Opinion in Solid State …, 2011 - Elsevier
The prospect of enhanced device performance from III–V materials has been recognized for
at least 50years, and yet, relative to the phenomenal size of the Si-based IC industry, these …

A Combined Interface and Border Trap Model for High-Mobility Substrate Metal–Oxide–Semiconductor Devices Applied to and InP Capacitors

G Brammertz, A Alian, DHC Lin… - … on Electron Devices, 2011 - ieeexplore.ieee.org
By taking into account simultaneously the effects of border traps and interface states, the
authors model the alternating current capacitance-voltage (CV) behavior of high-mobility …

Electrical study of sulfur passivated In0. 53Ga0. 47As MOS capacitor and transistor with ALD Al2O3 as gate insulator

HC Lin, WE Wang, G Brammertz, M Meuris… - Microelectronic …, 2009 - Elsevier
In this paper we compare the interface trap distributions Dit (E) of sulfur treated Al2O3/In0.
53Ga0. 47As interfaces, which underwent MOS capacitor and transistor fabrication …

Atomic layer deposition of dielectrics on Ge and III–V materials for ultrahigh performance transistors

RM Wallace, PC McIntyre, J Kim, Y Nishi - MRS bulletin, 2009 - cambridge.org
The prospect of utilizing alternative transistor channel materials for ultrahigh performance
transistors will require suitable gate dielectrics for surface-channel field-effect devices. With …

On the interface state density at In0. 53Ga0. 47As/oxide interfaces

G Brammertz, HC Lin, M Caymax, M Meuris… - Applied Physics …, 2009 - pubs.aip.org
The authors model the capacitance-voltage (CV) behavior of In 0.53 Ga 0.47 As metal-oxide-
semiconductor (MOS) structures and compare the results to experimental C V-curves. Due to …

Surface defects and passivation of Ge and III–V interfaces

M Houssa, E Chagarov, A Kummel - Mrs Bulletin, 2009 - cambridge.org
The need for high-κ gate dielectrics and metal gates in advanced integrated circuits has
reopened the door to Ge and III–V compounds as potential replacements for silicon …

0.8-V Supply Voltage Deep-Submicrometer Inversion-Mode MOSFET

YQ Wu, WK Wang, O Koybasi… - IEEE Electron …, 2009 - ieeexplore.ieee.org
We report the experimental demonstration of deep-submicrometer inversion-mode In 0.75
Ga 0.25 As MOSFETs with ALD high-k Al 2 O 3 as gate dielectric. In this letter, n-channel …