In situ reflective high-energy electron diffraction (RHEED) is widely used to monitor the surface crystalline state during thin-film growth by molecular beam epitaxy (MBE) and …
G Rimal, RB Comes - Journal of Physics D: Applied Physics, 2024 - iopscience.iop.org
Molecular beam epitaxy (MBE), a workhorse of the semiconductor industry, has progressed rapidly in the last few decades in the development of novel materials. Recent developments …
Y Li, H Zhou, Y Liu, IC Tung, X Yan… - Advanced Functional …, 2024 - Wiley Online Library
It is well known that the properties of a crystal evolve as it increases in size from a single atomic plane to that of the bulk. Such size‐dependent transitions can stem from many …
K Nagai, M Anada, K Kowa, M Kitamura… - Physical Review …, 2023 - APS
It has been well documented that oxide films thinner than a few unit cells (uc) are often insulating, and the Anderson localization supported by the low dimensionality is one of the …
C Shen, W Zhan, M Li, Z Sun, J Tang… - Journal of …, 2024 - iopscience.iop.org
Ex situ characterization techniques in molecular beam epitaxy (MBE) have inherent limitations, such as being prone to sample contamination and unstable surfaces during …
B Davidson, A Petrov, F Li, R Pons, H Shin, C Liu… - 2024 - researchsquare.com
The perovskite ABO3 structure forms the basis for a wide range of functional and quantum materials discussed in the literature, although applications so far have been limited in part …