A 271.8 nm deep-ultraviolet laser diode for room temperature operation

Z Zhang, M Kushimoto, T Sakai… - Applied Physics …, 2019 - iopscience.iop.org
We present a deep-ultraviolet semiconductor laser diode that operates under current
injection at room temperature and at a very short wavelength. The laser structure was grown …

[HTML][HTML] Status of the growth and fabrication of AlGaN-based UV laser diodes for near and mid-UV wavelength

R Kirste, B Sarkar, P Reddy, Q Guo, R Collazo… - Journal of Materials …, 2021 - Springer
In this article, the development of mid-UV laser diodes based on the AlGaN materials system
is reviewed. The targeted wavelength for these lasers covers the range from 200 to 350 nm …

Ultralow-threshold electrically injected AlGaN nanowire ultraviolet lasers on Si operating at low temperature

KH Li, X Liu, Q Wang, S Zhao, Z Mi - Nature nanotechnology, 2015 - nature.com
Ultraviolet laser radiation has been adopted in a wide range of applications as diverse as
water purification, flexible displays, data storage, sterilization, diagnosis and bioagent …

[HTML][HTML] High internal quantum efficiency in AlGaN multiple quantum wells grown on bulk AlN substrates

Z Bryan, I Bryan, J Xie, S Mita, Z Sitar… - Applied Physics …, 2015 - pubs.aip.org
The internal quantum efficiency (IQE) of Al 0.55 Ga 0.45 N/AlN and Al 0.55 Ga 0.45 N/Al 0.85
Ga 0.15 N UVC MQW structures was analyzed. The use of bulk AlN substrates enabled us to …

Continuous-wave lasing of AlGaN-based ultraviolet laser diode at 274.8 nm by current injection

Z Zhang, M Kushimoto, A Yoshikawa… - Applied Physics …, 2022 - iopscience.iop.org
We demonstrated continuous-wave lasing of an AlGaN-based ultraviolet laser diode,
fabricated on a single-crystal AlN substrate when operating at 5 C. The threshold current …

The role of surface kinetics on composition and quality of AlGaN

I Bryan, Z Bryan, S Mita, A Rice, L Hussey… - Journal of Crystal …, 2016 - Elsevier
Abstract Metal–polar, Al-rich AlGaN films were grown on both single crystalline AlN and
sapphire substrates. The role of surface morphology and surface kinetics on AlGaN …

KOH based selective wet chemical etching of AlN, AlxGa1− xN, and GaN crystals: A way towards substrate removal in deep ultraviolet-light emitting diode

W Guo, R Kirste, I Bryan, Z Bryan, L Hussey… - Applied Physics …, 2015 - pubs.aip.org
A controllable and smooth potassium hydroxide-based wet etching technique was
developed for the AlGaN system. High selectivity between AlN and AlxGa1ÀxN (up to 12Â) …

Design and characterization of a low-optical-loss UV-C laser diode

Z Zhang, M Kushimoto, T Sakai… - Japanese Journal of …, 2020 - iopscience.iop.org
We present an optical modeling and characterization study of prototype ultraviolet laser
diode (LD) structures grown on single-crystal AlN substrates, with focus on the reduction of …

Recent progress on aluminum gallium nitride deep ultraviolet lasers by molecular beam epitaxy

Q Zhang, X Yin, S Zhao - physica status solidi (RRL)–Rapid …, 2021 - Wiley Online Library
Over the past decades, the aluminum gallium nitride (AlGaN) alloy system has received
wide interest for the development of semiconductor deep ultraviolet (DUV) lasers due to its …

[HTML][HTML] Low-threshold stimulated emission at 249 nm and 256 nm from AlGaN-based multiple-quantum-well lasers grown on sapphire substrates

XH Li, T Detchprohm, TT Kao, MM Satter… - Applied Physics …, 2014 - pubs.aip.org
Optically pumped deep-ultraviolet (DUV) lasing with low threshold was demonstrated from
AlGaN-based multiple-quantum-well (MQW) heterostructures grown on sapphire substrates …