Superconformal film growth: from smoothing surfaces to interconnect technology

TP Moffat, TM Braun, D Raciti… - Accounts of Chemical …, 2023 - ACS Publications
Conspectus Electronics manufacturing involves Cu electrodeposition to form 3D circuitry of
arbitrary complexity. This ranges from nanometer-wide interconnects between individual …

3-D integration and through-silicon vias in MEMS and microsensors

Z Wang - Journal of Microelectromechanical Systems, 2015 - ieeexplore.ieee.org
After two decades of intensive development, 3-D integration has proven invaluable for
allowing integrated circuits to adhere to Moore's Law without needing to continuously shrink …

Polymer inhibitors enable >900 cm2 dynamic windows based on reversible metal electrodeposition with high solar modulation

MT Strand, TS Hernandez, MG Danner, AL Yeang… - Nature Energy, 2021 - nature.com
Dynamic windows with adjustable tint give users control over the flow of light and heat to
decrease the carbon footprint of buildings and improve the occupants' comfort. Despite the …

Fabrication of sharp silicon hollow microneedles by deep-reactive ion etching towards minimally invasive diagnostics

Y Li, H Zhang, R Yang, Y Laffitte, U Schmill… - Microsystems & …, 2019 - nature.com
Microneedle technologies have the potential for expanding the capabilities of wearable
health monitoring from physiology to biochemistry. This paper presents the fabrication of …

A High Efficiency Electrodeposited Cu2ZnSnS4 Solar Cell

S Ahmed, KB Reuter, O Gunawan… - Advanced Energy …, 2012 - Wiley Online Library
Abstract High‐performance Cu2ZnSnS4 photovoltaic devices are demonstrated using
electrodeposition of metal stacks and annealing of a CuZnSn precursor in a sulfur …

Direct electrochemical formation of nanostructured amorphous Co (OH) 2 on gold electrodes with enhanced activity for the oxygen evolution reaction

MA Sayeed, T Herd, AP O'Mullane - Journal of Materials Chemistry A, 2016 - pubs.rsc.org
The oxides of cobalt have recently been shown to be highly effective electrocatalysts for the
oxygen evolution reaction (OER) under alkaline conditions. In general species such as …

Revisiting the polyethylene glycol-chloride adsorption structure on Cu electrode in sulfuric acid solution by wide-frequency ATR-SEIRAS

Y Wu, Z Mao, TW Jiang, XY Ma, L Zheng… - The Journal of …, 2023 - ACS Publications
Polyethylene glycol (PEG) is a typical suppressor in the presence of chloride anions for Cu
interconnect electroplating in the field of microelectronics manufacture, yet its adsorption …

[图书][B] Liquid cell electron microscopy

FM Ross - 2017 - books.google.com
" Liquid cell electron microscopy allows us to apply the powerful imaging and analysis
capabilities of the electron microscope to liquid samples, visualizing structures and …

Reaction and nucleation mechanisms of copper electrodeposition from ammoniacal solutions on vitreous carbon

D Grujicic, B Pesic - Electrochimica Acta, 2005 - Elsevier
The reaction and nucleation mechanisms of the electrodeposition of copper from
ammoniacal solutions were investigated by cyclic voltammetric (cv) and …

Classification of suppressor additives based on synergistic and antagonistic ensemble effects

P Broekmann, A Fluegel, C Emnet, M Arnold… - Electrochimica …, 2011 - Elsevier
Three fundamental types of suppressor additives for copper electroplating could be
identified by means of potential transient measurements. These suppressor additives differ …