Abstract Au/ZnO/n-Si device was obtained by using atomic layer deposition (ALD) technique, and it was characterized by I–V measurement in a wide temperature from 100 to …
In this communication, we report the results of the studies on dielectric, electroresistance (ER), magnetoresistance (MR) and electric pulse induced resistance (EPIR) change …
We employed hematoxylin as interfacial layer between the n-and p-type silicon substrate and cobalt (Co) metallic contact to obtain and compare Co/hematoxylin/n-Si and …
We understand the role of defect dynamics on the resistive switching (RS) characteristics of pulsed laser deposition (PLD) grown Y 0.95 Sr 0.05 MnO 3 (YSMO) manganite films on the …
In the present communication, high crystalline quality LaMnO 3/Nd 0.7 Sr 0.3 MnO 3/SrTiO 3 (LMO/NSMO/STO) structures were fabricated using low cost chemical solution deposition …
Synthesis and electrical transport properties of GdMnO 3/Al-doped ZnO (AZO) and GdMnO 3/ZnO (ZO) heterostructures grown by vacuum deposition are described. Pulsed laser …
We fabricated undoped and Cu doped TiO 2 thin films by spin coating technique and employed the films as interfacial oxide layer between the Al and n-type Si to investigate the …
B Rajyaguru, H Gohil, H Dadhich, K Gadani… - New Journal of …, 2023 - pubs.rsc.org
Control over the movements of free charge carriers across any manganite based interface can functionalize the device for spintronic applications. This can be achieved through …