Surface termination and interfacial interactions are critical for advanced solid-state quantum
applications. In this paper, we demonstrate that atomic layer deposition (ALD) can both …

Unique atomic arrangements (ie, defects) on material surfaces may exhibit distinctive
reactivity that affords opportunities for selective surface chemistry exclusively at those sites …

Anatase TiO2 nanoparticles support a subtle diversity of surface aqua and hydroxy
coordination environments that are characteristic of distinct facets and defect sites. The …

In situ pyroelectric calorimetry and spectroscopic ellipsometry were used to investigate
surface reactions in atomic layer deposition (ALD) of zirconium oxide (ZrO2). Calibrated and …

While atomic layer deposition (ALD) processes from across the periodic table have been
designed to deposit conformal thin films, an atomistic view of disparate substrate sites …

Photocatalytic methanol reforming represents a promising solution to energy and
environmental challenges, yet the CO 2 by-product poses significant environmental …

The utility of atomic layer deposition (ALD) continues to expand beyond conformal thin-film
fabrication to include area-or site-selective ALD. We previously identified a strategy for site …

Surface termination and interfacial interactions are critical for advanced solid-state quantum
applications. In this paper, we demonstrate that atomic layer deposition (ALD) can both …

Area-selective atomic layer deposition (AS-ALD) has emerged as a transformative technique
in nanotechnology, enabling the precise deposition of materials on designated substrates …

Site-selective atomic layer deposition (SS-ALD) on metal oxide nanoparticles will require
subtle surface chemical control through site-specific surface functionalization (eg selective …