Synthesis and applications of III–V nanowires

E Barrigón, M Heurlin, Z Bi, B Monemar… - Chemical …, 2019 - ACS Publications
Low-dimensional semiconductor materials structures, where nanowires are needle-like one-
dimensional examples, have developed into one of the most intensely studied fields of …

Doping of III-nitride materials

P Pampili, PJ Parbrook - Materials Science in Semiconductor Processing, 2017 - Elsevier
In this review paper we will report the current state of research regarding the doping of III-
nitride materials and their alloys. GaN is a mature material with both n-type and p-type …

Lattice parameters of AlN bulk, homoepitaxial and heteroepitaxial material

D Nilsson, E Janzén… - Journal of Physics D …, 2016 - iopscience.iop.org
Homoepitaxial layers of AlN and heteroepitaxial layers of AlN on 4H-SiC substrates were
grown by metalorganic chemical vapor deposition at high temperatures up to 1400 C, and …

N-polar AlN buffer growth by metal–organic vapor phase epitaxy for transistor applications

J Lemettinen, H Okumura, T Palacios… - Applied Physics …, 2018 - iopscience.iop.org
We present the electrical characterization of N-polar AlN layers grown by metal–organic
vapor phase epitaxy and the demonstration of N-polar AlN-channel metal–semiconductor …

[HTML][HTML] On the Ge shallow-to-deep level transition in Al-rich AlGaN

P Bagheri, P Reddy, S Mita, D Szymanski… - Journal of Applied …, 2021 - pubs.aip.org
Contrary to the arsenides where donors undergo stable DX transition, we find that Ge in
AlGaN does not suffer from the DX transition; instead, it undergoes a shallow donor (30 …

Progress and challenges of AlGaN Schottky diodes grown on AlN substrates

R Dalmau, HS Craft, R Schlesser, S Mita… - ECS …, 2017 - iopscience.iop.org
Quasi-vertical, high Al composition AlGaN Schottky diodes with breakdown voltages up to
500 V were grown on high quality AlN single crystal substrates. Diodes exhibited a~ 10 6 …

[HTML][HTML] Infrared dielectric functions, phonon modes, and free-charge carrier properties of high-Al-content AlxGa1− xN alloys determined by mid infrared spectroscopic …

S Schöche, T Hofmann, D Nilsson… - Journal of Applied …, 2017 - pubs.aip.org
We report on the analysis of a combined mid-infrared spectroscopic ellipsometry and mid-
infrared optical Hall effect investigation of wurtzite structure c-plane oriented, crack-free …

n-Type conductivity bound by the growth temperature: the case of Al 0.72 Ga 0.28 N highly doped by silicon

A Kakanakova-Georgieva, SL Sahonta… - Journal of Materials …, 2016 - pubs.rsc.org
High-Al-content AlxGa1− xN layers, x∼ 0.72, have been grown by metal organic chemical
vapour deposition (MOCVD) at a temperature ranging from 1000 to 1100° C, together with …

Point defects in group-III nitrides

PP Paskov, B Monemar - Defects in Advanced Electronic Materials and …, 2018 - Elsevier
Point defects in semiconductors play a fundamental role for the material properties. Dopants
like impurities forming shallow donors and acceptors provide the means of controlling the …

Studies on plasma assisted molecular beam epitaxial growth of GaN-based multilayer heterostructures on Si for photodetector application

Y Zheng - 2019 - dr.ntu.edu.sg
III-Nitride materials have gathered enormous attention and undergone fast development,
due to superior properties such as wide band gap, high stability, high electron motilities …