Bias temperature instability in SiC metal oxide semiconductor devices

C Yang, S Wei, D Wang - Journal of Physics D: Applied Physics, 2021 - iopscience.iop.org
Although silicon carbide (SiC) metal oxide semiconductor field-effect transistors (MOSFETs)
are commercially available, bias temperature instability (BTI) defined as shifts in V th in SiC …

Behavior of silicon carbide materials under dry to hydrothermal conditions

N Biscay, L Henry, T Adschiri, M Yoshimura… - Nanomaterials, 2021 - mdpi.com
Silicon carbide materials are excellent candidates for high-performance applications due to
their outstanding thermomechanical properties and their strong corrosion resistance. SiC …

Molecular insight of the interface evolution of silicon carbide under hyperthermal atomic oxygen impact

Z Cui, J Zhao, G Yao, Z Li, D Wen - Physics of Fluids, 2022 - pubs.aip.org
One of the key challenges faced by hypersonic flying is the complex thermal–mechanical–
chemical coupling effect between thermal protection materials and non-equilibrium flow …

ReaxFF reactive molecular dynamics study of orientation dependence of initial silicon carbide oxidation

V Šimonka, A Hössinger, J Weinbub… - The Journal of …, 2017 - ACS Publications
We analyze the early stage of the highly anisotropic silicon carbide oxidation behavior with
reactive force field molecular dynamics simulations. The oxidation of a-, C,-m-, and Si …

Mixture model for thermo-chemo-mechanical processes in fluid-infused solids

M Anguiano, A Masud, KR Rajagopal - International Journal of Engineering …, 2022 - Elsevier
This work presents a new thermodynamically consistent model for thermo-chemo-
mechanical processes in open systems comprised of nonlinear elastic solids that are …

Formation of carbon interstitial-related defect levels by thermal injection of carbon into n-type 4H-SiC

R Karsthof, M Etzelmüller Bathen… - Journal of Applied …, 2022 - pubs.aip.org
Electrical properties of point defects in 4 H-SiC have been studied extensively, but those
related to carbon interstitials (C i⁠) have remained elusive until now. Indeed, when …

Oxidation simulation study of silicon carbide nanowires: A carbon-rich interface state

H Gao, H Wang, M Niu, L Su, X Fan, J Wen… - Applied Surface Science, 2019 - Elsevier
Silicon carbide nanowires (SiCNWs) have attracted increasing attention due to their
excellent properties and wide range of potential applications. SiCNWs covered with oxide …

Oxidation induced stress in SiO2/SiC structures

X Li, A Ermakov, V Amarasinghe, E Garfunkel… - Applied Physics …, 2017 - pubs.aip.org
Physical stress in SiO 2/SiC stacks formed by the thermal oxidation of SiC is studied
experimentally through both room temperature ex-situ and variable temperature (25–1150 …

Anomalous carbon clusters in 4H-SiC/SiO2 interfaces

Y Kagoyama, M Okamoto, T Yamasaki… - Journal of applied …, 2019 - pubs.aip.org
We investigated a metal-oxide-semiconductor interface of dry-oxidized (000 1⁠) 4H-SiC,
which was known as the most electrically deteriorated SiC MOSFET, by electrically detected …

Single photon sources in 4H-SiC metal-oxide-semiconductor field-effect transistors

Y Abe, T Umeda, M Okamoto, R Kosugi… - Applied physics …, 2018 - pubs.aip.org
We present single photon sources (SPSs) embedded in 4H-SiC metal-oxide-semiconductor
fieldeffect transistors (MOSFETs). They are formed in the SiC/SiO2 interface regions of wet …