Scatterometry is a fast, precise and low cost way to determine the mean pitch and
dimensional parameters of periodic structures with lateral resolution of a few nanometer. It is …

Scatterometry is a well-established, fast and precise optical metrology method used for the
characterization of sub-lambda periodic features. The Fourier scatterometry method, by …

Optical scatterometry is the state of art optical inspection technique for quality control in
lithographic process. As such, any boost in its performance carries very relevant potential in …

Scatterometry is a common technique for the characterization of nanostructured surfaces.
With shrinking dimensions, fewer and fewer propagating diffraction orders exist, and …

Line edge roughness (LER) has been identified as a potential source of uncertainty in
optical scatterometry measurements. Characterizing the effect of LER on optical …

Reflection of light measured in a polarimetric, scatterometric and spectroscopic way allows
the measurement of structures in a broad size range from large (meter) scales like …

Characterization of structures using conventional optical microscopy is restricted by the
diffraction limit. Techniques such as atomic force and scanning electron microscopy can …

The influence of edge roughness in angle resolved scatterometry at periodically structured
surfaces is investigated. A good description of the radiation interaction with structured …

Metrology is an important area in semiconductor manufacturing. As the dimensions of
nanostructure rapidly shrink, the optical critical dimension (OCD) metrology has become …

Scatterfield microscopy is the union of a high-magnification imaging platform and the
angular and/or wavelength control of scatterometry at the sample surface. Scatterfield …