Alternative plasmonic materials: beyond gold and silver

GV Naik, VM Shalaev, A Boltasseva - Advanced materials, 2013 - Wiley Online Library
Materials research plays a vital role in transforming breakthrough scientific ideas into next‐
generation technology. Similar to the way silicon revolutionized the microelectronics …

[PDF][PDF] Fast diffusion in semiconductors

UM Gosele - Annual Review of Materials Science, 1988 - lab.semi.ac.cn
Elements diffusing in semiconductors are frequently classified as" slow" or" fast" diffusers (1).
Slow diffusers have diffusion coefficients reasonably close to those of self-diffusion, whereas …

Point defects, diffusion processes, and swirl defect formation in silicon

TY Tan, U Gösele - Applied Physics A, 1985 - Springer
The paper consists of three parts. In the first part we review the basic experimental and
theoretical results which shaped our present knowledge on point defects and diffusion …

Ion beams in silicon processing and characterization

E Chason, ST Picraux, JM Poate, JO Borland… - Journal of applied …, 1997 - pubs.aip.org
General trends in integrated circuit technology toward smaller device dimensions, lower
thermal budgets, and simplified processing steps present severe physical and engineering …

Energetics of self-interstitial clusters in Si

NEB Cowern, G Mannino, PA Stolk, F Roozeboom… - Physical Review Letters, 1999 - APS
The transient supersaturation in a system undergoing Ostwald ripening is related to the
cluster formation energy E fc as a function of cluster size n. We use this relation to study the …

Diffusion in strained Si (Ge)

NEB Cowern, PC Zalm, P Van der Sluis… - Physical Review Letters, 1994 - APS
Abstract Experiments on Si-rich SiGe layers show an exponential increase in Ge diffusion
and an exponential decrease in B diffusion as a function of compressive strain, indicating a …

[图书][B] Microelectronic materials

CRM Grovenor - 2017 - taylorfrancis.com
This practical book shows how an understanding of structure, thermodynamics, and
electrical properties can explain some of the choices of materials used in microelectronics …

Impact of the electronic structure on the solubility and diffusion of 3d transition elements in silicon

D Gilles, W Schröter, W Bergholz - Physical Review B, 1990 - APS
The dependence of the solubilities and diffusion coefficients of Mn, Fe, and Co on doping
with B, P, and As in Si have been studied by the tracer method. An enhancement of the …

[图书][B] Halbleiter-Technologie

I Ruge - 2013 - books.google.com
Lag die Industrie um 1970 bei Strukturbreiten von 4 bis 5 µm und Ausbeuten von
10%(teilweise darunter), so werden jetzt größtintegrierte Schaltkreise mit 2-µm-Strukturen …

Self-diffusion in silicon: similarity between the properties of native point defects

A Ural, PB Griffin, JD Plummer - Physical Review Letters, 1999 - APS
Self-diffusion measurements in silicon are extended to the range 800–900 C by monitoring
30 Si diffusion in isotopically enriched structures. Comparing P, Sb, and self-diffusion under …