Integrated circuit, system for and method of forming an integrated circuit

Y Jung-Chan, TW Chiang, JCJ Kao, H Zhuang… - US Patent …, 2020 - Google Patents
2017-11-28 Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
reassignment TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD …

Method for analyzing electromigration (EM) in integrated circuit

LIN Chin-Shen, MH Lin, WY Lo… - US Patent …, 2021 - Google Patents
Methods for analyzing electromigration (EM) in an inte grated circuit (IC) are provided. The
layout of the IC is obtained. A metal segment is selected from the layout according to the …

Method for analyzing electromigration (EM) in integrated circuit

LIN Chin-Shen, MH Lin, WY Lo… - US Patent …, 2022 - Google Patents
Methods for analyzing electromigration (EM) in an integrated circuit (IC) are provided. The
layout of the IC is obtained. A metal segment is selected from the layout according to a …

Integrated circuit, system for and method of forming an integrated circuit

Y Jung-Chan, TW Chiang, JCJ Kao, H Zhuang… - US Patent …, 2022 - Google Patents
An integrated circuit structure includes a first, a second and a third set of conductive
structures and a first and a second set of vias. The first set of conductive structures extend in …

Method of forming an integrated circuit

Y Jung-Chan, TW Chiang, JCJ Kao, H Zhuang… - US Patent …, 2023 - Google Patents
2018-11-30 Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
reassignment TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD …

Integrated circuit, system for and method of forming an integrated circuit

Y Jung-Chan, TW Chiang, JCJ Kao, H Zhuang… - US Patent …, 2024 - Google Patents
2022-08-10 Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
reassignment TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD …

Method for analyzing electromigration (EM) in integrated circuit

LIN Chin-Shen, MH Lin, WY Lo… - US Patent …, 2023 - Google Patents
Methods for analyzing electromigration (EM) in an integrated circuit (IC) are provided. A
layout of the IC is obtained. A metal segment is selected from the layout according to a …