Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
OO Versolato - Plasma Sources Science and Technology, 2019 - iopscience.iop.org
Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
Physical processes in EUV sources for microlithography
VY Banine, KN Koshelev… - Journal of Physics D …, 2011 - iopscience.iop.org
The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a
source, as well as the EUVL tool, has to fulfil very high demands both technical and cost …
source, as well as the EUVL tool, has to fulfil very high demands both technical and cost …
Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas
Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma
have been experimentally investigated. An absorption spectrum of a uniform Sn plasma …
have been experimentally investigated. An absorption spectrum of a uniform Sn plasma …
Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd: YAG laser-produced tin plasmas
H Tanaka, A Matsumoto, K Akinaga… - Applied Physics …, 2005 - pubs.aip.org
The direct comparison of the emission characteristics of an extreme ultraviolet (EUV) light
between the CO 2 and the Nd: YAG laser-produced plasmas (LPP) with a solid tin target is …
between the CO 2 and the Nd: YAG laser-produced plasmas (LPP) with a solid tin target is …
Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography
Extreme ultraviolet (EUV) radiation from laser-produced plasma (LPP) has been thoroughly
studied for application in mass production of next-generation semiconductor devices. One …
studied for application in mass production of next-generation semiconductor devices. One …
High-energy ions from Nd: YAG laser ablation of tin microdroplets: comparison between experiment and a single-fluid hydrodynamic model
DJ Hemminga, L Poirier, MM Basko… - Plasma Sources …, 2021 - iopscience.iop.org
We present the results of a joint experimental and theoretical study of plasma expansion
arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …
arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …
Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma
We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …
plasma over a wide parameter range by varying the diameter of the targeted tin …
Analyses of the Sn IX–Sn XII spectra in the EUV region
SS Churilov, AN Ryabtsev - Physica Scripta, 2006 - iopscience.iop.org
Abstract The Sn IX–Sn XII spectra excited in a vacuum spark have been analysed in the 130–
160 Å wavelength region. The analysis was based on the energy parameter extrapolation in …
160 Å wavelength region. The analysis was based on the energy parameter extrapolation in …