Microstructural evolution of helium-irradiated 6H–SiC subjected to different irradiation conditions and annealing temperatures: A multiple characterization study

N Daghbouj, BS Li, M Callisti, HS Sen, M Karlik… - Acta Materialia, 2019 - Elsevier
The microstructural phenomena occurring in 6H–SiC subjected to different irradiation
conditions and annealing temperatures were investigated to assess the suitability of 6H–SiC …

The structural evolution of light-ion implanted 6H-SiC single crystal: Comparison of the effect of helium and hydrogen

N Daghbouj, BS Li, M Callisti, HS Sen, J Lin, X Ou… - Acta Materialia, 2020 - Elsevier
The microstructure evolution of hydrogen-implanted 6H-SiC at different temperatures and
fluences is investigated by using various experimental techniques. In H-implanted samples …

Interface-driven strain in heavy ion-irradiated Zr/Nb nanoscale metallic multilayers: validation of distortion modeling via local strain mapping

HS Sen, N Daghbouj, M Callisti, M Vronka… - … Applied Materials & …, 2022 - ACS Publications
Nanolayered metallic alloys are promising materials for nuclear applications thanks to their
resistance to radiation damage. Here, we investigate the effect of ion (C, Si, and Cu) …

Interphase boundary layer-dominated strain mechanisms in Cu+ implanted Zr-Nb nanoscale multilayers

N Daghbouj, M Callisti, HS Sen, M Karlik, J Čech… - Acta Materialia, 2021 - Elsevier
Abstract Sputter-deposited Zr/Nb nanoscale metallic multilayers with a periodicity of 27 (thin)
and 96 nm (thick) were subjected to Cu+ implantation with low and high fluences and then …

6H-SiC blistering efficiency as a function of the hydrogen implantation fluence

N Daghbouj, BS Li, M Karlik, A Declemy - Applied Surface Science, 2019 - Elsevier
Blistering phenomenon by H implantation into 6H-SiC and high-temperature annealing is
only possible in a surprisingly narrow window of ion fluence. By combining experimental …

Efficient ion-slicing of InP thin film for Si-based hetero-integration

J Lin, T You, M Wang, K Huang, S Zhang, Q Jia… - …, 2018 - iopscience.iop.org
Integration of high quality single crystalline InP thin film on Si substrate has potential
applications in Si-based photonics and high-speed electronics. In this work, the exfoliation of …

Blister formation in He-H co-implanted InP: A comprehensive atomistic study

N Daghbouj, J Lin, HS Sen, M Callisti, B Li… - Applied Surface …, 2021 - Elsevier
The blistering efficiency in He-H-ions co-implanted and annealed InP has been found to
peak and vanish in a narrow range of ion fluence ratio (Φ H/Φ He= 1. 5–3. 5) with a fixed He …

Blistering kinetics in H-implanted 4H-SiC for large-area exfoliation

M Sharma, KK Soni, A Kumar, T Ohkubo… - Current Applied …, 2021 - Elsevier
Layer transfer of single-crystalline SiC based on layer splitting and wafer bonding on an
alternate substrate is a viable approach to fabricate SiC power devices at a lower cost …

Three-dimensional X-FEM modeling of crack coalescence phenomena in the Smart CutTM technology

E Pali, A Gravouil, A Tanguy, D Landru… - Finite Elements in …, 2023 - Elsevier
Abstract A new 3D X-FEM approach is proposed to model crack coalescence phenomena in
the Smart Cut TM technology. An adaptive mesh is developed based on a 3D fractal mesh …

Xenon Nanobubbles and Residual Defects in Annealed Xe‐Implanted Si (001): Analysis by the Combination of Advanced Synchrotron X‐Ray Diffraction and …

GA Calligaris, R Lang, J Bettini… - Advanced Materials …, 2024 - Wiley Online Library
Residual crystalline defects on the subsurface of Xe‐implanted Si (001) and post‐annealed
substrates are investigated by advanced X‐ray diffraction and transmission electron …