Nanomanufacturing: a perspective
JA Liddle, GM Gallatin - ACS nano, 2016 - ACS Publications
Nanomanufacturing, the commercially scalable and economically sustainable mass
production of nanoscale materials and devices, represents the tangible outcome of the …
production of nanoscale materials and devices, represents the tangible outcome of the …
Reducing photocurable polymer pattern shrinkage and roughness during dry etching in photo-nanoimprint lithography
SH Kim, H Hiroshima, S Inoue… - Japanese journal of …, 2004 - iopscience.iop.org
When we apply a photocurable polymer to photo-nanoimprint lithography, dry etching is
necessary to remove the remaining photocurable polymer after imprinting. During dry …
necessary to remove the remaining photocurable polymer after imprinting. During dry …
Electromagnetic characterization of nanoimprint mold inspection
Y Deng, AR Neureuther - Journal of Vacuum Science & Technology B …, 2003 - pubs.aip.org
The electromagnetic effects of opaque mold materials in exposure, and complementary
mask inspection in the innovative nanoimprint technique of White and Wood are explored …
mask inspection in the innovative nanoimprint technique of White and Wood are explored …
Simulation of exposure and alignment for nano-imprint lithography
Y Deng, AR Neureuther - … Lithographic Technologies VI, 2002 - spiedigitallibrary.org
Rigorous electromagnetic simulation with TEMPEST is used to examine the exposure and
alignment processes for nano-imprint lithography with attenuating thin-film molds …
alignment processes for nano-imprint lithography with attenuating thin-film molds …
Fabrication of trilayer resist using photocuring-imprint lithography
SH Kim, H Hiroshima, S Inoue, Y Kurashima… - Journal of Vacuum …, 2003 - pubs.aip.org
We fabricated fine trilayer resist structures (photocurable polymer/spin-on-glass
(SOG)/Novolak resist) with a smooth-top surface and low-edge roughness, which is useful …
(SOG)/Novolak resist) with a smooth-top surface and low-edge roughness, which is useful …
Adaptive alignment of photomasks for overlay improvement
CF Chen, RL Engelstad, EG Lovell, DL White… - Journal of Vacuum …, 2002 - pubs.aip.org
The International Technology Roadmap for Semiconductors defines a 23 nm overlay error
budget at the 65 nm technology node by the year 2007. To meet the stringent requirement, a …
budget at the 65 nm technology node by the year 2007. To meet the stringent requirement, a …
Characterization of material contrast and effective wavelength effects in immersion inspection
Y Deng, AR Neureuther - Journal of Vacuum Science & Technology B …, 2004 - pubs.aip.org
The electromagnetic effects of complementary clear-opaque nano-imprint mold inspection
and light scattering from small defects are analyzed through simulation. For a wavelength of …
and light scattering from small defects are analyzed through simulation. For a wavelength of …
Improvement of pattern shrinkage and roughness of photocurable polymer during dry etch process in photo-nanoimprint lithography
SH Kim, H Hiroshima, S Inoue… - Digest of Papers …, 2003 - ieeexplore.ieee.org
In this paper, photo-nanoimprint lithography is being focussed owing to working conditions
at room temperature and low pressure. In this imprint lithography photocurable polymer is …
at room temperature and low pressure. In this imprint lithography photocurable polymer is …