Turbulence-like Cu/MoS2 films: structure, mechanical and tribological properties

WD Sun, J Wang, KW Wang, JJ Pan, R Wang… - Surface and Coatings …, 2021 - Elsevier
The application of pure molybdenum disulfide (MoS 2) film as solid lubricant is limited due to
its low hardness and high friction coefficient in the atmosphere. It is reported that the …

Unusual Selective Monitoring of N,N-Dimethylformamide in a Two-Dimensional Material Field-Effect Transistor

A Fukui, K Matsuyama, H Onoe, S Itai, H Ikeno… - ACS …, 2023 - ACS Publications
N, N-Dimethylformamide (DMF) is an essential solvent in industries and pharmaceutics. Its
market size range was estimated to be 2 billion US dollars in 2022. Monitoring DMF in …

Low-Carrier-Density Sputtered MoS2 Film by Vapor-Phase Sulfurization

K Matsuura, T Ohashi, I Muneta, S Ishihara… - Journal of Electronic …, 2018 - Springer
Sulfurization with sulfur vapor has been demonstrated to be useful for fabricating sputtered-
multilayer MoS 2 films with an approximately 4-nm thickness. With this process, sulfur …

The effects of Ti content on tribological and corrosion performances of MoS2–Ti composite films

Y Hu, J Wang, W Li, X Tang, T Tan, Z Li, H Feng… - Vacuum, 2024 - Elsevier
The easy shear of the MoS 2 film and thus the low coefficient of friction makes it one of the
excellent candidates for solid lubricant coatings. In this paper, the Ti content in MoS 2–Ti …

Effects of Deposition and Annealing Temperature on the Structure and Optical Band Gap of MoS2 Films

G Chen, B Lu, X Cui, J Xiao - Materials, 2020 - mdpi.com
In this study, molybdenum disulfide (MoS2) film samples were prepared at different
temperatures and annealed through magnetron sputtering technology. The surface …

Strong edge-induced ferromagnetism in sputtered MoS2 film treated by post-annealing

T Shirokura, I Muneta, K Kakushima, K Tsutsui… - Applied Physics …, 2019 - pubs.aip.org
We report edge-induced ferromagnetism in a sputtered molybdenum disulfide (MoS 2) film
having a long whole-edge length, with the effects of crystallinity improvement including edge …

Ohmic contact between titanium and sputtered MoS2 films achieved by forming-gas annealing

M Toyama, T Ohashi, K Matsuura… - Japanese Journal of …, 2018 - iopscience.iop.org
A molybdenum disulfide (MoS 2) film prepared by RF sputtering is considered as the new
channel material of MOSFETs. However, it is difficult to achieve a low contact resistance for …

Thermal annealing effects on the electrophysical characteristics of sputtered MoS2 thin films by Hall effect measurements

M Qi, J Xiao, C Gong - Semiconductor Science and Technology, 2019 - iopscience.iop.org
Abstract Transition-metal dichalcogenide (MoS 2) is gaining increasing attention as a
promising high-performance material in practical applications because of its wide-range …

Low-Temperature MoS2 Film Formation Using Sputtering and H2S Annealing

J Shimizu, T Ohashi, K Matsuura… - IEEE Journal of the …, 2018 - ieeexplore.ieee.org
Low-carrier density and high-crystallinity molybdenum disulfide (MoS 2) films were
fabricated by low-temperature and clean process based on a UHV RF sputtering system …

Eliminating Trap‐States and Functionalizing Vacancies in 2D Semiconductors by Electrochemistry

J Shi, X Zhao, Z Wang, Y Liu - Small, 2019 - Wiley Online Library
One major challenge that limits the applications of 2D semiconductors is the detrimental
electronic trap states caused by vacancies. Here using grand‐canonical density functional …