Highly charged ions in magnetic fusion plasmas: research opportunities and diagnostic necessities

P Beiersdorfer - Journal of Physics B: Atomic, Molecular and …, 2015 - iopscience.iop.org
Highly charged ions play a crucial role in magnetic fusion plasmas. These plasmas are
excellent sources for producing highly charged ions and copious amounts of radiation for …

Tungsten spectra recorded at the LHD and comparison with calculations

CS Harte, C Suzuki, T Kato, HA Sakaue… - Journal of Physics B …, 2010 - iopscience.iop.org
We have measured extreme ultraviolet (EUV) spectra from highly charged tungsten ions in
low-density and high-temperature plasmas produced in the Large Helical Device at the …

EUV spectroscopy of highly charged ions in an electron-beam ion trap

J Scheers, C Shah, A Ryabtsev, H Bekker, F Torretti… - Physical Review A, 2020 - APS
Extreme-ultraviolet (EUV) spectra of Sn 13+− Sn 15+ ions have been measured in an
electron-beam ion trap (EBIT). A matrix inversion method is employed to unravel convoluted …

Tracer-encapsulated solid pellet injection system

S Sudo, N Tamura - Review of Scientific Instruments, 2012 - pubs.aip.org
The method of tracer-encapsulated solid pellet (TESPEL) is now flourishing in various fields.
The original purpose to study impurity transport without giving substantial perturbation on …

Quasi-Moseley's law for strong narrow bandwidth soft x-ray sources containing higher charge-state ions

H Ohashi, T Higashiguchi, Y Suzuki, G Arai… - Applied Physics …, 2014 - pubs.aip.org
Bright narrow band emission observed in optically thin plasmas of high-Z elements in the
extreme ultraviolet spectral region follows a quasi-Moseley's law. The peak wavelength can …

Effect of Cl2 Radical on Dry Development of Spin-Coated Metal Oxide Resist

S Namgoong, HJ Kim, YK Kang, MC Kim… - … Applied Materials & …, 2024 - ACS Publications
In this study, the effects of Cl2 radicals on dry development of spin-coated metal oxide resist
(MOR) and changes in its surface binding states were investigated to verify the mechanism …

Recent progress in source development for extreme UV lithography

G O'Sullivan, D Kilbane, R D'Arcy - Journal of Modern Optics, 2012 - Taylor & Francis
The continuation of Moore's law for semiconductor fabrication envisages the introduction of
extreme ultraviolet lithography (EUVL) based on a source wavelength of 13.5 nm for high …

Observation of EUV spectra from gadolinium and neodymium ions in the Large Helical Device

C Suzuki, F Koike, I Murakami… - Journal of Physics B …, 2012 - iopscience.iop.org
We have observed extreme ultraviolet (EUV) spectra from highly charged gadolinium and
neodymium ions in optically thin plasmas produced in the Large Helical Device at the …

EUV spectroscopy of highly charged high Z ions in the Large Helical Device plasmas

C Suzuki, F Koike, I Murakami, N Tamura… - Physica …, 2014 - iopscience.iop.org
We present recent results on the extreme ultraviolet (EUV) spectroscopy of highly charged
high Z ions in plasmas produced in the Large Helical Device (LHD) at the National Institute …

Interpretation of spectral emission in the 20 nm region from tungsten ions observed in fusion device plasmas

C Suzuki, CS Harte, D Kilbane, T Kato… - Journal of Physics B …, 2011 - iopscience.iop.org
We have measured extreme ultraviolet spectra from tungsten ions in the 20 nm region in
plasmas produced in the Large Helical Device at the National Institute for Fusion Science …