Kinetic study on initial surface reaction of titanium dioxide growth using tetrakis (dimethylamino) titanium and water in atomic layer deposition process: Density …
T Promjun, T Rattana, PP Pansila - Chemical Physics, 2022 - Elsevier
The initial steps in the growth process of atomic layer deposition (ALD) of titanium dioxide at
room temperature (RT) were investigated using tetrakis (dimethylamino) titanium (TDMAT) …
room temperature (RT) were investigated using tetrakis (dimethylamino) titanium (TDMAT) …
Molecular dynamics simulations of the structure and dynamics of aqueous NaCl solutions on extended quartz surfaces
Y Yao, Q Li, M Lai, Q Wu, Y Mo, Q Li, B Liu… - Journal of Applied …, 2021 - pubs.aip.org
Corrosion of silica surfaces by solutions of sodium chloride (NaCl) occurs often; the
aggregation of ions and water molecules on the silica surface represents the first step. In this …
aggregation of ions and water molecules on the silica surface represents the first step. In this …
Coadsorption of Na+ and H2O on the surface of hydroxylated silica
G Wang, Z Chen, H Qiu, T He - Molecular Simulation, 2020 - Taylor & Francis
Molecular simulation was used to investigate the coadsorption mechanism of Na+ and H2O
on the hydroxylated silicon wafer. Water molecules can form a 3.5 Å-thickness bimolecular …
on the hydroxylated silicon wafer. Water molecules can form a 3.5 Å-thickness bimolecular …
Molecular dynamics study of water and ion behaviors of mixed salts solutions on extended quartz surface
B Liu, Y Yao, Q Li, P Lan, Y Fan, W Li - Journal of Applied Physics, 2022 - pubs.aip.org
The adoption and evolution of water molecules and ions in mixed electrolytes at the surface
play vital roles in the physical properties and chemical reactions of SiO 2-like corrosion. The …
play vital roles in the physical properties and chemical reactions of SiO 2-like corrosion. The …
[PDF][PDF] The Characteristic of TMG adsorption on the Si (100)(2× 1) surface in atomic layer deposition (ALD): Computational prediction of Si9H12O2GaCH3 structure
PP Pansila, S Sukhasena… - NU. International Journal of …, 2019 - thaiscience.info
This work reports the adsorption characteristic of trimethylgallium (TMG) on the silicon
surface in the adsorption step of atomic layer deposition (ALD) to prepare gallium oxide thin …
surface in the adsorption step of atomic layer deposition (ALD) to prepare gallium oxide thin …