Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry
as the leading-edge lithography technique for continued miniaturization of semiconductor …

The adhesion and formation of microbial biofilm on material surfaces is a relevant problem
in many areas including in medicine and biomaterials engineering. Biofilms are the primary …

Extreme ultraviolet (EUV) lithography at 13.5 nm is the main candidate for patterning
integrated circuits and reaching sub-10-nm resolution within the next decade. Should …

High-resolution lithography often involves thin resist layers which pose a challenge for
pattern characterization. Direct evidence that the pattern was well-defined and can be used …

When designing a new nanostructure or microstructure, one can follow a processing‐based
manufacturing pathway, in which the structure properties are defined based on the …

Interference lithography is an effective method of patterning periodic structures with limits set
by light diffraction. Using this method at the short wavelengths of extreme ultraviolet (EUV) …

The amount of absorbed light in thin photoresist films is a key parameter in photolithographic
processing, but its experimental measurement is not straightforward. The optical absorption …

The semiconductor devices industry is one of the most significant sectors, based on its broad
applications and substantial economic and strategic implications. This article overviews the …

We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages. These
cage molecules were already known to function as a negative tone photoresist for EUV …

Given the need for a next-generation technology node in the area of integrated circuits (ICs),
improvement in the properties of resist materials, particularly sensitivity (ED), resolution …