On a dynamic preventive maintenance policy for a system under inspection

CT Chen, YW Chen, J Yuan - Reliability Engineering & System Safety, 2003 - Elsevier
The purpose of this article is to propose both state and time-dependent preventive
maintenance policy for a multi-state deteriorating system, which is equipped with inspection …

Dynamic preventive maintenance strategy for an aging and deteriorating production system

CT Chen - Expert Systems with Applications, 2011 - Elsevier
This paper proposes a dynamic preventive maintenance strategy for a multi-state
deteriorating production system. A real-time operating state can be derived via the healthy …

Feedback control of chemical mechanical polishing device providing manipulation of removal rate profiles

AP Shanmugasundram, AT Schwarm… - US Patent …, 2011 - Google Patents
(57) ABSTRACT A method of controlling surface non-uniformity of a Wafer in a polishing
operation includes (a) providing a model for a Wafer polishing that de? nes a plurality of …

Real-time plasma monitoring technique using incident-angle-dependent optical emission spectroscopy for computer-integrated manufacturing

IJ Kim, I Yun - Robotics and Computer-Integrated Manufacturing, 2018 - Elsevier
Although various monitoring techniques are currently used for semiconductor
manufacturing, OES is a non-contact and non-destructive plasma measurement tool that …

Scheduling on parallel machines with time constraints and equipment health factors

A Obeid, S Dauzère-Pérès… - 2012 IEEE International …, 2012 - ieeexplore.ieee.org
In this paper, we are interested in the integration of scheduling and Advanced Process
Control (APC) in semiconductor manufacturing. We consider the problem of scheduling jobs …

Multivariate approach for equipment health monitoring

C Krauel, L Weishäupl - IFAC-PapersOnLine, 2016 - Elsevier
This paper deals with a method for equipment health monitoring through a multivariate
approach. The approach concentrates on the autonomous classification of different process …

Data acquisition approach for real-time equipment monitoring and control

G Baweja, B Ouyang - 13th Annual IEEE/SEMI Advanced …, 2002 - ieeexplore.ieee.org
With current high standards for product quality, reliability and performance, semiconductor
manufacturers are constantly looking for ways and means to monitor and control the …

An Autoregressive Fault Model for Condition Monitoring of Electrical Machines in Deep-level Mines

HJ Groenewald, M Kleingeld… - … Conference on the …, 2018 - ieeexplore.ieee.org
Equipment failure is a serious issue in the mining sector since it affects both reliability and
availability. This in turn may result in production losses. Strategies are thus needed to …

Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles

AP Shanmugasundram, AT Schwarm… - US Patent …, 2014 - Google Patents
Zafman LLP (57) ABSTRACT A method of controlling Surface non-uniformity of a wafer in a
polishing operation includes (a) providing a model for a wafer polishing that defines a …

Scheduling and Advanced Process Control in semiconductor Manufacturing

A Obeid - 2012 - theses.hal.science
In this thesis, we discussed various possibilities of integrating scheduling decisions with
information and constraints from Advanced Process Control (APC) systems in …