Atomic layer deposition (ALD) technology is one of the cornerstones of the modern
microelectronics industry, where it is exploited in the fabrication of high‐quality inorganic …

Atomic layer deposited (ALD) high-dielectric-constant (high-k) materials have found
extensive applications in a variety of electronic, optical, optoelectronic, and photovoltaic …

Rapid progress in the performance of organic devices has increased the demand for
advances in the technology of thin-film permeation barriers and understanding the failure …

Mechanical properties of atomic-layer deposited alumina thin films containing amorphous, α-
Al 2 O 3, θ-Al 2 O 3, δ-Al 2 O 3 and γ-Al 2 O 3 phases were characterized. To initiate the α-Al …

Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic
process enable the growth of conformal thin films with precise thickness control and sharp …

A novel method of nanomechanical testing of multilayered Al 2 O 3/TiO 2 nanolaminates
was implemented by the nanoindentation technique. The indentation data were …

In this study, the internal and external stabilities of ap–i–n methylammonium lead iodide
perovskite solar cell (PSC) are improved. Polystyrene (PS) is introduced into the perovskite …

Atomic layer deposition was used to produce 90–105 nm thick alumina-zirconia mixtures
and nanolaminate structures on soda-lime glass substrate. The resultant chemical and …

Structural, electronic and mechanical properties of ZnO/Graphene (ZnO/G) nanolaminates
fabricated by low temperature atomic layer deposition (ALD) and chemical vapor deposition …

The physical properties of polymers can be significantly altered by blending them with
inorganic components. This can be done during the polymerization process, but also by post …