Growth and applications of GeSn-related group-IV semiconductor materials

S Zaima, O Nakatsuka, N Taoka… - … and technology of …, 2015 - iopscience.iop.org
We review the technology of Ge 1− x Sn x-related group-IV semiconductor materials for
developing Si-based nanoelectronics. Ge 1− x Sn x-related materials provide novel …

Computational design and property predictions for two-dimensional nanostructures

R Xu, X Zou, B Liu, HM Cheng - Materials Today, 2018 - Elsevier
Recent success in isolating and growing various two-dimensional (2D) materials with
intriguing properties has pushed forward the search for new 2D nanostructures with novel …

High-electrical-conductivity multilayer graphene formed by layer exchange with controlled thickness and interlayer

H Murata, Y Nakajima, N Saitoh, N Yoshizawa… - Scientific reports, 2019 - nature.com
The layer exchange technique enables high-quality multilayer graphene (MLG) on arbitrary
substrates, which is a key to combining advanced electronic devices with carbon materials …

Metal-induced layer exchange of group IV materials

K Toko, T Suemasu - Journal of Physics D: Applied Physics, 2020 - iopscience.iop.org
Layer exchange (LE) is an interesting phenomenon in which metal and semiconductor
layers exchange during heat treatment. A great deal of effort has been put into research on …

Record-high hole mobility germanium on flexible plastic with controlled interfacial reaction

T Imajo, T Ishiyama, N Saitoh… - ACS Applied …, 2021 - ACS Publications
A semiconductor thin film with high carrier mobility was fabricated on a flexible film. During
the solid-phase crystallization process of the densified amorphous Ge layer, the interfacial …

High-hole mobility polycrystalline Ge on an insulator formed by controlling precursor atomic density for solid-phase crystallization

K Toko, R Yoshimine, K Moto, T Suemasu - Scientific reports, 2017 - nature.com
High-carrier mobility semiconductors on insulators are essential for fabricating advanced
thin-film transistors, allowing for three-dimensional integrated circuits or high-performance …

Improving carrier mobility of polycrystalline Ge by Sn doping

K Moto, R Yoshimine, T Suemasu, K Toko - Scientific reports, 2018 - nature.com
To improve the performance of electronic devices, extensive research efforts have recently
focused on the effect of incorporating Sn into Ge. In the present work, we investigate how Sn …

n-Type polycrystalline germanium layers formed by impurity-doped solid-phase growth

K Nozawa, T Nishida, T Ishiyama… - ACS Applied …, 2023 - ACS Publications
The carrier mobility of polycrystalline Ge thin-film transistors has significantly improved in
recent years, raising hopes for the realization of next-generation electronic devices. Here …

High hole mobility tin-doped polycrystalline germanium layers formed on insulating substrates by low-temperature solid-phase crystallization

W Takeuchi, N Taoka, M Kurosawa… - Applied Physics …, 2015 - pubs.aip.org
We investigated the effects of incorporation of 0%–2% tin (Sn) into amorphous germanium
(Ge) on its crystallization behavior and electrical properties. Incorporation of only 0.2% Sn …

High carrier mobility in orientation-controlled large-grain (≥ 50 μm) Ge directly formed on flexible plastic by nucleation-controlled gold-induced-crystallization

JH Park, K Kasahara, K Hamaya, M Miyao… - Applied Physics …, 2014 - pubs.aip.org
High-carrier-mobility semiconductors on flexible-plastic are essential to realize flexible
electronics. For this purpose, electrical properties of orientation-controlled large-grain Ge …