State of the art and future perspectives in advanced CMOS technology

HH Radamson, H Zhu, Z Wu, X He, H Lin, J Liu… - Nanomaterials, 2020 - mdpi.com
The international technology roadmap of semiconductors (ITRS) is approaching the
historical end point and we observe that the semiconductor industry is driving …

A review of micromachined sensors for automotive applications

P Mohankumar, J Ajayan, R Yasodharan, P Devendran… - Measurement, 2019 - Elsevier
The development of onboard sensors in combination with internet connectivity provides a
better driving experience, which fuels the growth of automotive market. The ever growing …

Selective area epitaxy of III–V nanostructure arrays and networks: Growth, applications, and future directions

X Yuan, D Pan, Y Zhou, X Zhang, K Peng… - Applied Physics …, 2021 - pubs.aip.org
Selective area epitaxy (SAE) can be used to grow highly uniform III–V nanostructure arrays
in a fully controllable way and is thus of great interest in both basic science and device …

Analysis of AlGaN/GaN HEMT using discrete field plate technique for high power and high frequency applications

ASA Fletcher, D Nirmal, J Ajayan… - AEU-International Journal …, 2019 - Elsevier
In this paper, the RF and DC characteristics of AlGaN/GaN High electron mobility transistor
is analysed using discrete field plate technique. Surprisingly, it reduces the device parasitic …

Improved RF and DC performance in AlGaN/GaN HEMT by P-type doping in GaN buffer for millimetre-wave applications

L Arivazhagan, D Nirmal, D Godfrey, J Ajayan… - … -International Journal of …, 2019 - Elsevier
In this paper, the RF and DC performance of AlGaN/GaN HEMT having p-type doping in
GaN buffer layer was analysed. Novelty of this work lies in the inclusion of P-type doping in …

GaAs metamorphic high electron mobility transistors for future deep space-biomedical-millitary and communication system applications: A review

J Ajayan, D Nirmal, P Mohankumar, D Kuriyan… - Microelectronics …, 2019 - Elsevier
Following the introduction of metamorphic high electron mobility transistors (MHEMTs) 30
years back, there has been a rapid growth in their use in advanced MMIC (monolithic …

Machine-learning-assisted multi-objective optimization in vertical zone refining of ultra-high purity indium

Z Shang, Z Lian, M Li, K Han, H Zheng - Separation and Purification …, 2023 - Elsevier
Optimization of processing parameters cannot rely on the trial-and-error method for the
production of ultra-high purity metals owing to the complexity of indium raw material and …

Effect of InAs insertion layer on the structural and optical property improvement of InGaAs/InAlAs multiple quantum wells

X Hou, Y Kang, F Lin, B Meng, K Li, J Tang… - Journal of Alloys and …, 2024 - Elsevier
Abstract A 100 periods In 0.53 Ga 0.47 As/In 0.52 Al 0.48 As multiple quantum wells (MQWs)
with and without 2 ML InAs insertion layers (ISLs) were grown on semi-insulating GaAs …

[HTML][HTML] Nanofabrications of T shape gates for high electron mobility transistors in microwaves and THz waves, a review

M Zhu, Y Xie, J Shao, Y Chen - Micro and Nano Engineering, 2021 - Elsevier
High electron mobility transistors (HEMTs) are the basic building block in microwave
monolithic integration circuits (MMICs) for broad applications in micrometer (0.3–100 GHz) …

Equivalent small-signal model of InP-based HEMTs with accurate radiation effects characterization

HQ Yun, B Mei, YB Su, F Yang, P Ding… - Journal of Applied …, 2023 - pubs.aip.org
In this paper, an effective equivalent modeling technique has been proposed to describe
small-signal characteristics of InP-based high electron mobility transistors (HEMTs) after …