Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that
has attracted high interest in recent years due to its inherent simplicity, high throughput, low …

Creating inorganic nanostructures for development of nanoelectronic device components is
a highly active research area. The ability for manipulation of the chemistry of materials, as …

In the integration flow of directed self-assembly with block copolymers (BCP), the selective
removal of one phase of the polymer with respect to the other one is an important step …

This paper reports on the etch challenges to overcome for the implementation of PS-b-
PMMA block copolymer's Directed Self-Assembly (DSA) in CMOS via patterning level. Our …

A graphoepitaxy directed self-assembly process using cylindrical phase block copolymers is
regarded as a promising approach for patterning irregularly distributed contact holes in …

Density multiplication and contact shrinkage of patterned templates by directed self-
assembly (DSA) of block copolymers (BCP) stands out as a promising alternative to …

Directed Self-Assembly (DSA) is today a credible alternative lithographic technology for
semiconductor industry [1]. In the coming years, DSA integration could be a standard …

Considering the goal of lithography under its most general aspect–that is, transferring and
recording mask or template information in the form of contrast between the imaged and non …

The semiconductor devices dimensions continue to shrink to keep up with the ITRS
roadmap. Due to delay and extensive cost of EUV for 14 nm technology node and beyond …

The directed self-assembly (DSA) of block copolymers (BCPs) is a promising low-cost
approach to patterning structures with critical dimensions (CDs) which are smaller than can …