Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Page 1 Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale …

Recently, with scaling down of semiconductor devices, need for nanotechnology has
increased enormously. For nanoscale devices especially, each of the layers should be as …

One of the key challenges in nanotechnology is to control a self‐assembling system to
create a specific structure. Self‐organizing block copolymers offer a rich variety of periodic …

Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined
chemically nanopatterned surfaces (or chemical patterns) combines advantages of …

We are inspired by the beauty and simplicity of self-organizing materials and the promise
they hold for enabling continued improvements in semiconductor technology. Self assembly …

In order to harness the potential of block copolymers to produce nanoscale structures that
can be integrated with existing silicon-based technologies, there is a need for compatible …

The lithographic process is arguably the key enabling technology for the digital age.
Hundreds of millions of devices can be fabricated on a single chip because patterns with …

In the midst of this era of nanotechnology and shrinking device size, block copolymers have
evolved from their use in traditional application areas (eg, adhesives, additives, and …

Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …