Physical, chemical, and in vitro toxicological characterization of nanoparticles in chemical mechanical planarization suspensions used in the semiconductor industry …

D Speed, P Westerhoff, R Sierra-Alvarez… - Environmental …, 2015 - pubs.rsc.org
This tutorial review focuses on aqueous slurries of dispersed engineered nanoparticles
(ENPs) used in chemical mechanical planarization (CMP) for polishing wafers during …

Functionalized boron nitride ceramic nanofiltration membranes for semiconductor wastewater treatment

Y Lee, M Cha, Y So, IH Song, C Park - Separation and Purification …, 2022 - Elsevier
Boron nitride (BN) nanomaterials were used to enhance the separation performance of
membranes due to their ability to create more nanochannels with excellent chemical …

Role of co-existing ions in the removal of dissolved silica by ceramic nanofiltration membrane

Y So, Y Lee, S Kim, J Lee, C Park - Journal of Water Process Engineering, 2023 - Elsevier
Even low concentrations of nano-sized silica particles should be effectively removed from
chemical mechanical polishing (CMP) wastewater as they can corrode the pipes in …

Clean enhancing elimination of boron from silicon kerf using Na2O-SiO2 slag treatment

L Huang, J Chen, M Fang, S Thomas, A Danaei… - Journal of Cleaner …, 2018 - Elsevier
Silicon kerf waste can be used as a secondary resource for the recovery of high purity silicon
for solar cells production. Boron is amongst the most deleterious impurities in silicon and its …

An overview of solid/liquid separation methods and size fractionation techniques for engineered nanomaterials in aquatic environment

N Wu, Y Wyart, Y Liu, J Rose… - Environmental Technology …, 2013 - Taylor & Francis
The increasing use of engineered nanomaterials (ENMs) will inevitably result in their
release into natural environment and thereby lead to the exposure of living organisms …

Dead-end and crossflow ultrafiltration process modelling: Application on chemical mechanical polishing wastewaters

K Ohanessian, M Monnot, P Moulin, JH Ferrasse… - … Research and Design, 2020 - Elsevier
Dynamic simulation of ultrafiltration process is applied to the treatment of chemical
mechanical polishing wastewater from microelectronic industry. The ultrafiltration of …

[HTML][HTML] Revisiting the water-use efficiency performance for microelectronics manufacturing facilities: Using Taiwan's Science Parks as a case study

W Den, CH Chen, YC Luo - Water-energy nexus, 2018 - Elsevier
Semiconductors are enabling technologies that drive today's information economy by
producing a broad spectrum of microelectronic consumer products including computers, flat …

Performance of integrated membrane filtration and electrodialysis processes for copper recovery from wafer polishing wastewater

YN Su, WS Lin, CH Hou, W Den - Journal of Water Process Engineering, 2014 - Elsevier
This study assesses the efficiency of a combining ultrafiltration (UF) and electrodialysis (ED)
processes to treat and reclaim wastewater, a discharge of the copper chemical mechanical …

A metallurgical route to upgrade silicon kerf derived from diamond-wire slicing process

L Huang, A Danaei, M Fang, S Thomas, X Luo… - Vacuum, 2019 - Elsevier
Silicon kerf generated during the diamond-wire slicing process contains various impurities
and are considered industrial waste. In order to utilize the waste, a feasible process to purify …

Environmental aspects of planarization processes

DE Speed - Advances in chemical mechanical planarization (CMP), 2022 - Elsevier
This chapter describes the occurrence, behavior, and treatment of wastewater that is
produced by the Chemical Mechanical Planarization (CMP) process when it is used to …