Here for the first time is an integrated mathematical view of the physics and numerical
modeling of optical projection lithography that efficiently covers the full spectrum of the …

5,308,991 A 5/1994 Kaplan 5,528,508 A 6, 1996 Russell et al. 5,573,890 A 11/1996 Spence
5,705.301 A 1/1998 Garza et al. 5,858,580 A 1/1999 Wang et al. 5,862,058 A 1/1999 …

This topical review provides an overview of nanolithographic techniques for nanoarrays.
Using patterning techniques such as lithography, normally we aim for a higher order …

5,573,890 A 11/1996 Spence~~~~~~~~~-- 430/311 as computer-readable program code
embodied in computer 5,705,301 A 1/1998 Garza et a1~ 430/5 readable media. The …

We have constructed a theory of polarimetry of illumination used in 193nm lithography
equipments, fabricated a polarimeter mask, and demonstrated it for a hyper-NA (numerical …

In this paper we report on the performance enhancements on the NXT immersion scanner
platform to support the immersion lithography roadmap. We particular discuss scanner …

Ronchi lateral shearing interferometry is widely applied in wavefront measurement of
advanced lithography tools. In Ronchi lateral shearing interferometry, higher-order …

We propose a general method of designing phase-analysis algorithms for Ronchi phase-
shifting lateral-shearing interferometry. Based on the expression and method, three new …

Ronchi shearing interferometry is a promising technique for in situ wavefront aberration
measurement of the projection lens in advanced photolithography systems. The Van Cittert …

Double-Ronchi shearing interferometry is widely used in wavefront aberration
measurements for advanced lithography projection lens systems. A rigorous simulation …