摘要光刻投影物镜的畸变是影响光刻机套刻精度最重要的因素之一, 畸变会导致物镜的横向放大
率随视场的增大而变化, 曝光到硅片上的图形相对于其理想位置发生偏移, 从而引起套刻误差 …

To enhance the resolution and alignment accuracy in semiconductor manufacturing, it is
important to measure overlay errors and control them into the tolerances by removing …

The multilayer overlay lithography process is one of the most important steps in
semiconductor manufacturing. It is a multistage manufacturing process in which errors are …

Recent advances in model-based feedforward control of quality in multistage manufacturing
processes (MMPs) are used to introduce the concept of compensability of errors in product …

Electron Beam Lithography (EBL) metrology and least-square estimation of wafer-scale
distortions is used to determine InP membrane deformation as a result of bonding to different …

The synchronous model of computation together with a suitable execution platform facilitates
system-level timing predictability. This paper introduces an algebraic framework for precisely …

The lithography performed on a stepper is a key process of integrated circuit manufacturing.
To have a better resolution and alignment accuracy in lithography, it is important to model …

Overlay control is becoming increasingly more important with the scaling of technology. It
has become even more critical and more challenging with the move toward multiple …

In double patterning lithography (DPL), overlay error between two patterning steps at the
same layer translates into CD variability. Since CD uniformity budget is very tight, overlay …

Abstract In-Mold Decoration (IMD) is an efficient, durable and cost effective technique for
printing, painting, and forming plastic decorations. However, a large number of parameters …