MLCAD: A survey of research in machine learning for CAD keynote paper
Due to the increasing size of integrated circuits (ICs), their design and optimization phases
(ie, computer-aided design, CAD) grow increasingly complex. At design time, a large design …
(ie, computer-aided design, CAD) grow increasingly complex. At design time, a large design …
GAN-OPC: Mask optimization with lithography-guided generative adversarial nets
Mask optimization has been a critical problem in the VLSI design flow due to the mismatch
between the lithography system and the continuously shrinking feature sizes. Optical …
between the lithography system and the continuously shrinking feature sizes. Optical …
DAMO: Deep agile mask optimization for full chip scale
Continuous scaling of the VLSI system leaves a great challenge on manufacturing, thus
optical proximity correction (OPC) is widely applied in conventional design flow for …
optical proximity correction (OPC) is widely applied in conventional design flow for …
Machine learning for yield learning and optimization
Yield learning and optimization are critical for advanced IC design and manufacturing.
Recent advance in machine learning has brought a lot of new opportunities in improving the …
Recent advance in machine learning has brought a lot of new opportunities in improving the …
Lithobench: Benchmarking ai computational lithography for semiconductor manufacturing
Computational lithography provides algorithmic and mathematical support for resolution
enhancement in optical lithography, which is the critical step in semiconductor …
enhancement in optical lithography, which is the critical step in semiconductor …
DevelSet: Deep neural level set for instant mask optimization
As one of the key techniques for resolution enhancement technologies (RETs), optical
proximity correction (OPC) suffers from prohibitive computational costs as feature sizes …
proximity correction (OPC) suffers from prohibitive computational costs as feature sizes …
Generic lithography modeling with dual-band optics-inspired neural networks
Lithography simulation is a critical step in VLSI design and optimization for
manufacturability. Existing solutions for highly accurate lithography simulation with rigorous …
manufacturability. Existing solutions for highly accurate lithography simulation with rigorous …
L2o-ilt: Learning to optimize inverse lithography techniques
Inverse lithography technique (ILT) is one of the most widely used resolution enhancement
techniques (RETs) to compensate for the diffraction effect in the lithography process …
techniques (RETs) to compensate for the diffraction effect in the lithography process …
Neural-ILT: Migrating ILT to neural networks for mask printability and complexity co-optimization
Optical proximity correction (OPC) for advanced technology node now has become
extremely expensive and challenging. Conventional model-based OPC encounters …
extremely expensive and challenging. Conventional model-based OPC encounters …
A GPU-enabled level-set method for mask optimization
As the feature size of advanced integrated circuits keeps shrinking, resolution enhancement
techniques (RETs) are utilized to improve the printability in the lithography process. Optical …
techniques (RETs) are utilized to improve the printability in the lithography process. Optical …