Many different gas discharges and plasmas exhibit bistable states under a given set of
conditions, and the history-dependent hysteresis that is manifested by intensive quantities of …

Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …

Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in
the synthesis of nanoscale films with precise growth control. Apart from the well-established …

Atomic layer etching (ALE), a cyclic process of surface modification and removal of the
modified layer, is an emerging damage-less etching technology for semiconductor …

Anisotropic plasma-enhanced atomic layer etching (ALE) requires directional ions with a
well-defined ion energy to remove materials in a highly selective and self-limiting fashion. In …

The power absorption dynamics of electrons and the electrical asymmetry effect in
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …

Two classic radio-frequency (RF) plasmas, ie, the capacitively and the inductively coupled
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …

The electrical asymmetry effect (EAE) allows an almost ideal separate control of the mean
ion energy,< E i>⁠, and flux, Γ i⁠, at the electrodes in capacitive radio frequency discharges …

We show experimental observations of collisionless electron heating by the combinations of
the capacitive radio frequency (RF) bias power and the inductive power in low argon gas …

In capacitively coupled radio frequency discharges driven by two consecutive phase-locked
harmonics, the electrical asymmetry effect (EAE) allows one to generate a dc self-bias as a …