Sputtering of compound semiconductor surfaces. II. Compositional changes and radiation-induced topography and damage

JB Malherbe - Critical Reviews in Solid State and Material …, 1994 - Taylor & Francis
Ion bombardment often leads to compositional changes in the surface layers of
multicomponent targets. Such changes due to noble gas ion sputtering are discussed for InP …

Preferential sputtering of InP: an AES investigation

JB Malherbe, WO Barnard - Surface science, 1991 - Elsevier
AES was used to determine the surface composition of InP bombarded with 0.5 to 5 keV Ar+
ions. The (100),(110) and some vicinal planes were sputtered. On all of these surfaces the …

Some aspects of AES, EELS and EPES application: Interpretation of experimental results obtained on InP (100) surfaces

B Gruzza, C Pariset - Surface science, 1991 - Elsevier
This paper is devoted to the interpretation of the results obtained by AES, EPES and EELS
on InP (100). Accurate characterizations of the preparation of the substrates are given …

Surface etching of InP (100) by chlorine

WH Hung, JT Hsieh, HL Hwang, HY Hwang, CC Chang - Surface science, 1998 - Elsevier
The cleaning and etching of the InP (100) surface by chlorine gas is investigated using
synchrotron-radiation photoemission spectroscopy. A clean InP surface with a 4× 2 …

AES and EELS analysis of the interaction between phosphorus and metallic indium

M Bouslama, M Ghamnia, B Gruzza, F Miloua… - Journal of electron …, 1994 - Elsevier
Phosphorus, mainly in the form of P 2, has been evaporated on a InP (100) sample in order
to compensate P vacancies and to remove metallic In clusters from the surface. These …

k-resolved inverse photoemission of InP (100) surfaces

S Riese, E Milas, H Merz - Surface science, 1992 - Elsevier
k-resolved inverse photoemission (h ̵ ω= 9.9 eV) spectra were taken from (4× 2)
reconstructed non-ideal InP (100) surfaces prepared by sputter annealing at very low ion …

Low‐energy Ar+ ion bombardment‐induced modification of surface atomic bond lengths on InP(100) wafer

PS Mangat, P Soukiassian, Y Huttel, Z Hurych… - Applied physics …, 1993 - pubs.aip.org
We report the first direct measurement of surface interatomic bond distance modifications
due to ion bombardment. The experiments were performed using low energy Ar+ ion on a …

Study by EELS and EPES of the stability of InPO4/InP system

A Ouerdane, M Bouslama, M Ghaffour… - Applied surface …, 2008 - Elsevier
The goal of this research is to highlight the effectiveness of associating the spectroscopic
methods EELS and EPES in the study of thin film grown on substrates. We use the great …

SEM and XPS studies of nanohole arrays on InP (1 0 0) surfaces created by coupling AAO templates and low energy Ar+ ion sputtering

C Robert-Goumet, G Monier, B Zefack, S Chelda… - Surface science, 2009 - Elsevier
The aim of the present study is to demonstrate the feasibility to form well-ordered nanoholes
on InP (100) surfaces by low Ar+ ion sputtering process in UHV conditions from anodized …

Equilibrium structure of the InP (100) surface

JM Jin, LJ Lewis - Surface science, 1995 - Elsevier
We use ab initio total-energy minimization methods to study the equilibrium structure of the
InP (100) surface, and in particular examine the structure of the surface as a function of In …