K Shenai - IEEE Transactions on Electron Devices, 2018 - ieeexplore.ieee.org
The figure of merit (FOM) of a semiconductor device represents an important quality as it pertains to its performance limits and is often used to drive the technology development in a …
During the last 30 years, significant progress has been made to improve our understanding of gallium nitride and silicon carbide device structures, resulting in experimental …
PN Volpe, J Pernot, P Muret, F Omnès - Applied Physics Letters, 2009 - pubs.aip.org
Low boron doped homoepitaxial diamond layers were grown on Ib (100) diamond substrates with oxygen added to the gas mixture. The acceptor density of the samples has …
K Shenai - Proceedings of the IEEE, 2019 - ieeexplore.ieee.org
Power electronics switching devices made on wide-bandgap (WBG) semiconductors are known to have the potential to make a transformative impact on 21st century energy …
The Z 1/2 center in n-type 4H-SiC epilayers—a dominant deep level limiting the carrier lifetime—has been investigated. Using capacitance versus voltage (CV) measurements and …
C Darmody, N Goldsman - Journal of Applied Physics, 2019 - pubs.aip.org
In this work, we investigate the degree of incomplete ionization of Al doped 4H-SiC. In particular, we perform analysis on a comprehensive list of published measurements of …
A diamond Schottky pin diode (SPIND) with the highest reported current density to date of~ 116 kA/cm 2 is demonstrated, carrying a total current of~ 1.32 A through a wide pseudo …
M Kaneko, T Kimoto - IEEE Electron Device Letters, 2018 - ieeexplore.ieee.org
Silicon carbide (SiC) n-channel and p-channel junction field-effect transistors (JFETs) were fabricated by direct ion implantation into a high-purity semi-insulating 4H-SiC substrate …
T Kimoto - Japanese Journal of Applied Physics, 2018 - iopscience.iop.org
The minimum specific on-resistance of 4H-SiC {0001} unipolar devices as a function of the breakdown voltage was updated based on latest studies on intrinsic physical properties …