Nanoscale patterning of materials is widely used in a variety of device applications. Area
selective atomic layer deposition (ALD) has shown promise for deposition of patterned …

Recently, cost-effective nanosecond laser texturing has been used for the fabrication of
superhydrophobic surface on metals such as copper and brass. However, the wettability …

Area selective atomic layer deposition has the potential to significantly improve current
fabrication approaches by introducing a bottom-up process in which robust and conformal …

Recently, metallic superhydrophobic surfaces with ultrahigh adhesion have got plentiful
attention on account of their significance in scientific researches and industrial applications …

Room temperature soft chemical synthesis route is used to grow nanograined copper
hydroxide [Cu (OH) 2] thin films on glass and stainless steel substrates. The structural …

Area-selective atomic layer deposition (AS-ALD) has attracted a great deal of attention in
recent years for self-aligned accurate pattern placement with subnanometer thickness …

The initiation of corrosion can be triggered by defects in the adsorbed layer of organic
inhibitors. A detailed knowledge of the intermolecular forces between the inhibitor molecules …

Spherical particles have been sampled from soils and silica-rich rock coatings close to major
smelter centers at Coppercliff, Coniston, and Falconbridge in the Sudbury area, Canada …

Atomic layer deposition (ALD) of ruthenium dioxide (RuO2) thin films using metalorganic
precursors and O2 can be challenging because the O2 dose needs to be precisely tuned …

For years, many efforts in area selective atomic layer deposition (AS-ALD) have focused on
trying to achieve high-quality self-assembled monolayers (SAMs), which have been shown …