Over the past few decades many diagnostics have been developed to study the non-
equilibrium nature of plasma. These developments have given experimentalists the …

N 2 dissociation in pure nitrogen plasma has a long history of research. It seems to be a
complex process which comprises many reactions involving various electronic and …

In this work, we performed both experimental and model-based study of plasma parameters,
steady-state gas phase compositions and heterogeneous process kinetics in CF 4+ C 4 F 8+ …

The recombination of O (3 P) atoms on the surface of a Pyrex tube containing a DC glow
discharge in pure O 2 was studied over a wide range of pressure (0.2–10 Torr) and …

In this work, we discuss the effects of component ratios on plasma characteristics, chemistry
of active species, and silicon etching kinetics in CF4+ O2, CHF3+ O2, and C4F8+ O2 gas …

In the semiconductor etch process, as the critical dimension (CD) decreases and the
difficulty of the process control increases, in-situ and real-time etch profile monitoring …

Low-pressure RF plasma in fluorohydrocarbon gas mixtures is widely used in modern
microelectronics, eg in the etching of materials with a low dielectric constant (low-k) …

The state-of-art of studies of processes involving small fractions of particles formed as a
result of chemical transformations of the source gas or appearing from the outside as an …

This paper reflects on the future of low‐temperature plasma science in relation to the
manufacturing and novel uses of glass. The text summarizes the current state of the art on …

The transformations of the electron energy distribution (EEDF), their concentration, and
plasma space potential along the discharge gap between the hollow rectangular cathode …