CY Chen, CM Wang, WS Liao - Bulletin of the Chemical Society …, 2019 - academic.oup.com
Chemical lift-off lithography (CLL) is a chemo-topographical nanopatterning technique developed in 2012 which provides not only precise geometry control with sub-20 nm …
JC Arango, CJ Pintro, A Singh… - ACS Applied Materials & …, 2024 - ACS Publications
Nanometer-scale control over surface functionality is important in applications ranging from nanoscale electronics to regenerative medicine. However, approaches that provide precise …
CY Chang, WR Chen, P Kar, WS Liao… - Sensors and Actuators B …, 2023 - Elsevier
In this study, we presented a spatially-controlled molecular patterning technique to prepare liquid crystal (LC) microdroplet arrays on glass substrates. This technique utilizes an oxygen …
Chemical lift-off lithography (CLL) is a subtractive soft-lithographic technique that uses polydimethylsiloxane (PDMS) stamps to pattern self-assembled monolayers of functional …
CM Wang, HS Chan, CL Liao… - Beilstein Journal of …, 2023 - beilstein-journals.org
We introduce a unique soft lithographic operation that exploits stamp roof collapse-induced gaps to selectively remove an alkanethiol self-assembled monolayer (SAM) on Au to …
CY Chen, CM Wang, PS Chen, WS Liao - Chemical Communications, 2018 - pubs.rsc.org
Programmable surface-patterned functional DNA density is achieved via manipulation of molecular-level defects through chemical lift-off lithography. Artificial SAM defects are well …
CY Chen, CH Chang, CM Wang, YJ Li, HY Chu… - Nanomaterials, 2018 - mdpi.com
Nanoparticle alignment on the substrate attracts considerable attention due to its wide application in different fields, such as mechanical control, small size electronics …
Nanotechnology has become an important technology that cannot be ignored in high and new technology, and the application of nanomaterials is to design all aspects of life. With the …
CY Chen, HH Li, HY Chu, CM Wang… - … applied materials & …, 2018 - ACS Publications
Local molecular environment governs material interface properties, especially the substrate's exposing behavior and overall functionality expression. Although current …