The bottom-up fabrication of nano-and microscale structures from primary building blocks
(molecules, colloidal particles) has made remarkable progress over the past two decades …

The importance of autocatalysis spans from practical applications such as in chemically
amplified photoresists, to autocatalysis playing a fundamental role in evolution as well as a …

Photopolymers broadly comprise monomers, oligomers, polymers, or mixtures of the
aforementioned materials that upon exposure to light undergo photochemical reactions that …

This chapter describes polymers employed in formulation of chemically amplified resists for
microlithography, which have become the workhorse in device manufacturing for the last few …

Optically resonant metallic bowtie nanoantennas are utilized as fabrication tools for the first
time, resulting in the production of polymer resist nanostructures< 30 nm in diameter at …

Page 1 ADVANCES IN POLYMER SCIENCE 172 Microlithography Molecular Imprinting
Springer Page 2 Page 3 L. Page 4 Page 5 172 Advances in Polymer Science Editorial Board …

Optical immersion lithography utilizes liquids with refractive indices> 1 (the index of air)
below the last lens element to enhance numerical aperture and resolution, enabling sub-40 …

In extreme ultraviolet lithography (EUVL), a photoacid generator (PAG) blended photoresist
(PR) is used to transfer the blueprint from the mask to the wafer. The photoacids are …

Interest in new functional small molecule and polymer blends, such as polymer–fullerene
bulk heterojunction (BHJ) organic solar cells motivates the development of new methods to …

Many bottom-up and top-down techniques for nanomaterial and nanostructure generation
have enabled the development of applications in nanoelectronics and nanophotonics …