Lithography is one of the most critical processes in the manufacturing of micro-and nano-
devices. As device critical dimensions continue to shrink, variations in system parameters …

Extreme ultraviolet (EUV) lithography is one of the most indispensable technologies in
semiconductor manufacturing for 7 nm and smaller technology nodes. However, many key …

As 3D NAND advanced technology moves to increasingly denser storage capacity, the film
stacks required to create these devices correspondingly increase in quantity and height …

An important step in the production of integrated circuits is the projection of the pattern of
electronic connections on a silicon wafer. The light used to project the pattern moves over …

Background: The mathematical equations that explain overlay error of multiple-exposure
patterning schemes have not been fully described in the literature and some commonly …

In the past four decades, the number of electrical components that can be fitted into a single
integrated circuit has increased exponentially. This trend has enabled the production of …

The n+-base width of a two-terminal vertical thyristor fabricated with n++(top-emitter)-
p+(base)-n+(base)-p++(bottom-emitter) epitaxial Si layers was designed to produce a cross …

Overlay requirements are becoming more demanding as the semiconductor device design
dimensions continue to reduce in size. Thus, it is increasingly crucial to control overlay …

Bearings and guideways are critical components in precision positioning machines. Among
diverse types of bearing technologies, passive aerostatic bearings offer excellent precision …

The present disclosure generally relates to semiconductor structures and, more particularly,
to overlay optimization and methods of manufacture. The method includes performing, by a …