Virtual metrology as an approach for product quality estimation in Industry 4.0: a systematic review and integrative conceptual framework

PA Dreyfus, F Psarommatis, G May… - International Journal of …, 2022 - Taylor & Francis
Virtual metrology (VM) involves estimating a product's quality directly from production
process data without physically measuring it. This enables the product quality of each unit of …

2022 review of data-driven plasma science

R Anirudh, R Archibald, MS Asif… - … on Plasma Science, 2023 - ieeexplore.ieee.org
Data-driven science and technology offer transformative tools and methods to science. This
review article highlights the latest development and progress in the interdisciplinary field of …

The 2022 Plasma Roadmap: low temperature plasma science and technology

I Adamovich, S Agarwal, E Ahedo… - Journal of Physics D …, 2022 - iopscience.iop.org
The 2022 Roadmap is the next update in the series of Plasma Roadmaps published by
Journal of Physics D with the intent to identify important outstanding challenges in the field of …

Machine learning for advancing low-temperature plasma modeling and simulation

J Trieschmann, L Vialetto… - Journal of Micro …, 2023 - spiedigitallibrary.org
Machine learning has had an enormous impact in many scientific disciplines. It has also
attracted significant interest in the field of low-temperature plasma (LTP) modeling and …

Condensed Matter Systems Exposed to Radiation: Multiscale Theory, Simulations, and Experiment

AV Solov'yov, AV Verkhovtsev, NJ Mason… - Chemical …, 2024 - ACS Publications
This roadmap reviews the new, highly interdisciplinary research field studying the behavior
of condensed matter systems exposed to radiation. The Review highlights several recent …

Data‐driven plasma science: A new perspective on modeling, diagnostics, and applications through machine learning

M He, R Bai, S Tan, D Liu… - Plasma Processes and …, 2024 - Wiley Online Library
This paper comprehensively explores the integration of machine learning (ML) with
atmospheric pressure plasma, highlighting its transformative impact in areas, such as …

[HTML][HTML] Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production

S Park, Y Park, J Seong, H Lee, N Bae, K Roh… - Physics of …, 2024 - pubs.aip.org
Meter-scale of the large area inductively coupled plasma etchers with the capacitive power
coupling are widely applied for the mass production of OLED (organic light emitting diode) …

Plasma information-based virtual metrology (PI-VM) and mass production process control

S Park, J Seong, Y Jang, HJ Roh, JW Kwon… - Journal of the Korean …, 2022 - Springer
In this paper, we review the development of plasma engineering technology that improves
dramatically the production efficiency of OLED (organic light-emitting diode) displays and …

Virtual metrology modeling of reactive ion etching based on statistics-based and dynamics-inspired spectral features

KC Chien, CH Chang, D Djurdjanovic - Journal of Vacuum Science & …, 2021 - pubs.aip.org
Due to increasing demand on the fabrication yield and throughput in micro/nanoscale
manufacturing, virtual metrology (VM) has emerged as an effective data-based approach for …

Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma

J Song, M Lee, S Ryu, Y Jang, S Park, GH Kim - Current Applied Physics, 2023 - Elsevier
Ion-induced etch damage on trench surfaces of Ge 2 Sb 2 Te 5 (GST) by reactive ion etching
(RIE) is investigated with Ar/SF 6 capacitively coupled plasma (CCP). Etch damage on the …