Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the
synthesis of ultra-thin films with Å-level resolution in which a plasma is employed during one …

Metasurfaces are planar optical elements that hold promise for overcoming the limitations of
refractive and conventional diffractive optics. Original dielectric metasurfaces are limited to …

Mesoporous TiO2 nanoparticle films are used as photoanodes for high-efficiency dye-
sensitized solar cells (DSCs). In spite of excellent photovoltaic power conversion efficiencies …

The utilisation of Cu2O photocathodes for photoelectrochemical water splitting requires their
stabilisation due to photocorrosion in aqueous electrolytes. Ultrathin films of wide band gap …

Atomic layer deposition is widely acknowledged as a powerful technique for the deposition
of high quality layers for several applications including photovoltaics (PV). The capability of …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

In this topical review we catagorise all ambient pressure x-ray photoelectron spectroscopy
publications that have appeared between the 1970s and the end of 2018 according to their …

In thermoelectric, phase interface engineering proves effective in reducing the lattice thermal
conductivity via interface scattering and amplifying the density-of-states effective mass by …

Atomic layer deposition is a highly sought-after technique with high conformal and quality
film deposition. This study reviewed thin-film technology comprehensively and narrowed it to …