An extensive review is given of the results from literature on electron beam induced
deposition. Electron beam induced deposition is a complex process, where many and often …

Focused electron beam-induced deposition (FEBID) is a maskless, direct-write
nanolithography approach for the growth of nanostructures. In recent years, significant …

Beams of electrons and ions are now fairly routinely focused to dimensions in the nanometer
range. Since the beams can be used to locally alter material at the point where they are …

Focused electron-beam-induced (FEB-induced) deposition and etching are versatile, direct-
write nanofabrication schemes that allow for selective deposition or removal of a variety of …

Additive manufacturing of three-dimensional objects on the nanoscale is a very relevant
topic but still a highly challenging task. Among the pool of nanofabrication techniques …

Nanostructured materials made from group 10 (Ni, Pd, Pt) and group 11 (Cu, Ag, Au)
elements have outstanding technological relevance in microelectronics, nano-optics …

This article reviews the state-of-the-art of mechanical material properties and measurement
methods of nanostructures obtained by two nanoscale additive manufacturing methods: gas …

The rapidly growing field of nano-optics requires the development of flexible and reliable
fabrication methods at the nanometer scale. For that purpose direct writing of nanostructures …

Grayscale lithography is used to produce three-dimensional (3D) structures on micro-and
nanoscale. During the last decade, micro-optics and other applications were actively …

Electron beam induced deposition (EBID) is a direct-write lithographic technique that utilizes
the dissociation of volatile precursors by a focused electron beam in a low vacuum …