Optical characterisation of semiconductor surfaces and interfaces

JF McGilp - Progress in Surface Science, 1995 - Elsevier
Recent developments in optical spectroscopy applied to semiconductor surfaces and
interfaces are reviewed. It is shown that, by exploiting the underlying physics of the various …

[图书][B] Molecular beam epitaxy: fundamentals and current status

MA Herman, H Sitter - 2012 - books.google.com
Molecular Beam Epitaxy describes a technique in wide-spread use for the production of high-
quality semiconductor devices. It discusses the most important aspects of the MBE …

Geometric interpretation of reflection and transmission RHEED patterns

MA Hafez, MK Zayed, HE Elsayed-Ali - Micron, 2022 - Elsevier
Reflection high-energy electron diffraction (RHEED) is widely used to characterize the
surface structure of single crystals. Moreover, RHEED has become a standard tool to …

[图书][B] Epitaxy: physical principles and technical implementation

MA Herman, W Richter, H Sitter - 2013 - books.google.com
Epitaxy provides readers with a comprehensive treatment of the modern models and
modifications of epitaxy, together with the relevant experimental and technological …

[图书][B] Applied RHEED: reflection high-energy electron diffraction during crystal growth

W Braun - 1999 - books.google.com
The book describes RHEED (reflection high-energy electron diffraction) used as a tool for
crystal growth. New methods using RHEED to characterize surfaces and interfaces during …

[图书][B] Optical characterization of epitaxial semiconductor layers

G Bauer, W Richter - 2012 - books.google.com
The characterization of epitaxial layers and their surfaces has benefitted a lot from the
enormous progress of optical analysis techniques during the last decade. In particular, the …

Reflection high-energy electron diffraction oscillations during epitaxial growth of high-temperature superconducting oxides

T Terashima, Y Bando, K Iijima, K Yamamoto, K Hirata… - Physical review …, 1990 - APS
Strong intensity oscillations have been found in reflection high-energy electron diffraction
during epitaxial growth of BaTiO 3, La 2 CuO 4, and YBa 2 Cu 3 O 7− x with perovskite-type …

Reconstruction and defect structure of vicinal GaAs (001) and AlxGa1− xAs (001) surfaces during MBE growth

L Däweritz, R Hey - Surface Science, 1990 - Elsevier
Detailed surface phase diagrams of GaAs (001) and AlxGa1− xAs (001) have been
determined in a study of MBE growth on vicinal surfaces. Information on the defect structure …

Current understanding and applications of the RHEED intensity oscillation technique

PJ Dobson, BA Joyce, JH Neave, J Zhang - Journal of Crystal Growth, 1987 - Elsevier
The problem of reflection high energy electron diffraction (RHEED) and electron scattering
from smooth and growing surface is briefly reviewed. Evidence is given that strong electron …

Surfactant effect on the surface diffusion length in epitaxial growth

J Massies, N Grandjean - Physical Review B, 1993 - APS
It is shown that Te and Pb, which segregate at the surface during the epitaxial growth of
GaAs, respectively, decrease and increase the surface diffusion length. This indicates that …